SCHEMBL24944934

SCHEMBL24944934

O=C(OC1(c2ccccc2)CCNCC1)c1ccc2ccccc2c1O

nearest known ligand 0.48

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
LDHA P00338 1/20 0.48
CYP1B1 Q16678 6/20 0.43
ABCG2 Q9UNQ0 2/20 0.43
NPC1 O15118 1/20 0.41
RAB9A P51151 1/20 0.41
CYP1A1 P04798 4/20 0.40
CFTR P13569 1/20 0.40
KDM4E B2RXH2 2/20 0.39
KMT2A Q03164 2/20 0.39
ATM Q13315 1/20 0.39
HCRTR1 O43613 1/20 0.38
OPRM1 P35372 1/20 0.37
MEN1 O00255 1/20 0.37
LMNA P02545 1/20 0.37
MAPT P10636 1/20 0.37
HTT P42858 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26479242 0.87 OPRM1 (0.36) LDHANPC1RAB9AHCRTR1OPRM1
SCHEMBL24944294 0.86 NR4A1 (0.44) KDM4EKMT2AATMOPRM1MEN1
SCHEMBL26413459 0.84 OPRM1 (0.39) RAB9AKDM4EOPRM1LMNAMAPT
SCHEMBL24944624 0.84 OPRM1 (0.39) KDM4EOPRM1LMNA
SCHEMBL24944698 0.83 ABCG2 (0.43) ABCG2KDM4EKMT2AOPRM1MEN1
SCHEMBL24944880 0.83 THRB (0.48) KDM4EKMT2AOPRM1MEN1LMNA
SCHEMBL26479260 0.81 GRIN2D (0.39) KDM4EKMT2AOPRM1MEN1MAPT
SCHEMBL24944936 0.80 SMN1; SMN2 (0.40) NPC1KDM4EKMT2AOPRM1MEN1
SCHEMBL24944311 0.79 HPGD (0.44) NPC1RAB9AKDM4EOPRM1LMNA
SCHEMBL24944854 0.79 HPGD (0.44) NPC1RAB9AKDM4EKMT2AOPRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR LDHA 3469/4885CYP1B1 4457/4885ABCG2 4403/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.