SCHEMBL24944294

SCHEMBL24944294

O=C(OC1(c2ccccc2)CCNCC1)c1cccc2ccccc12

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NR4A1 P22736 1/20 0.44
NR4A2 P43354 1/20 0.44
NR4A3 Q92570 1/20 0.44
KMT2A Q03164 3/20 0.42
POLB P06746 1/20 0.42
GAA P10253 1/20 0.42
CDC25B P30305 2/20 0.40
HRH3 Q9Y5N1 2/20 0.40
DRD3 P35462 1/20 0.40
L3MBTL1 Q9Y468 3/20 0.40
HPGD P15428 2/20 0.40
KDM4E B2RXH2 1/20 0.40
OPRM1 P35372 3/20 0.39
MMP3 P08254 1/20 0.38
HDAC8 Q9BY41 1/20 0.38
CXCR5 P32302 1/20 0.38
AVPR1A P37288 1/20 0.38
MEN1 O00255 2/20 0.37
MAPT P10636 1/20 0.37
HTT P42858 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943764 0.89 KDM4E (0.43) NR4A1NR4A2NR4A3KMT2AGAA
SCHEMBL24943705 0.88 CDC25B (0.37) NR4A1NR4A2NR4A3KMT2APOLB
SCHEMBL24943740 0.87 OPRM1 (0.39) NR4A1NR4A2NR4A3KMT2APOLB
SCHEMBL24944934 0.86 LDHA (0.48) KMT2AKDM4EOPRM1MEN1MAPT
SCHEMBL24944893 0.85 CHRNB2 (0.48) KMT2AGAAHPGDMEN1MAPT
SCHEMBL26479242 0.85 OPRM1 (0.36) POLBHPGDOPRM1MAPTHTT
SCHEMBL24944623 0.82 RXFP1 (0.46) KMT2APOLBGAAL3MBTL1HPGD
SCHEMBL24944311 0.82 HPGD (0.44) HPGDKDM4EOPRM1MAPTTDP1
SCHEMBL26479264 0.82 HTR6 (0.42) KMT2ADRD3OPRM1MEN1OPRD1
SCHEMBL24944624 0.82 OPRM1 (0.39) HPGDKDM4EOPRM1TDP1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR NR4A1 1614/4885NR4A2 2175/4885NR4A3 1524/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.