SCHEMBL24944852

SCHEMBL24944852

Cc1ccccc1C(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 3/20 0.47
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
P2RX7 Q99572 2/20 0.38
MEN1 O00255 2/20 0.37
KMT2A Q03164 2/20 0.37
PLK1 P53350 1/20 0.36
PLK2 Q9NYY3 1/20 0.36
HPGD P15428 1/20 0.36
ESR1 P03372 1/20 0.35
ESR2 Q92731 1/20 0.35
TACR1 P25103 1/20 0.35
SCN1A P35498 1/20 0.35
SCN2A Q99250 1/20 0.35
SCN3A Q9NY46 1/20 0.35
CYP3A4 P08684 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
HTR2A P28223 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944859 0.91 OPRM1 (0.44) OPRM1P2RX7MEN1KMT2ATACR1
SCHEMBL24944854 0.90 HPGD (0.44) OPRM1NPC1RAB9AMEN1KMT2A
SCHEMBL24943681 0.89 OPRM1 (0.42) OPRM1P2RX7
SCHEMBL26478767 0.89 OPRM1 (0.42) OPRM1P2RX7TACR1SCN1ASCN2A
SCHEMBL24944861 0.87 OPRM1 (0.48) OPRM1P2RX7TACR1HTR2A
SCHEMBL24944858 0.87 OPRM1 (0.43) OPRM1NPC1RAB9AMEN1KMT2A
SCHEMBL24944093 0.87 OPRM1 (0.43) OPRM1NPC1MEN1KMT2AHPGD
SCHEMBL24944284 0.86 OPRM1 (0.45) OPRM1KMT2ATACR1HTR2A
SCHEMBL24944073 0.86 OPRM1 (0.44) OPRM1TACR1SCN1ASCN2ASCN3A
SCHEMBL26478751 0.85 OPRM1 (0.41) OPRM1NPC1KMT2AHPGDTACR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885NPC1 4818/4885RAB9A 3924/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.