SCHEMBL26478751

SCHEMBL26478751

Cc1ccc(Br)cc1C(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.41

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 2/20 0.41
NPSR1 Q6W5P4 2/20 0.41
CYP3A4 P08684 1/20 0.41
CYP2C9 P11712 1/20 0.41
CYP2C19 P33261 1/20 0.41
TACR1 P25103 3/20 0.38
ALDH1A1 P00352 2/20 0.34
GAA P10253 1/20 0.34
MAPT P10636 2/20 0.34
NPC1 O15118 1/20 0.34
HPGD P15428 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
KMT2A Q03164 1/20 0.34
FFAR4 Q5NUL3 1/20 0.33
SLC6A4 P31645 1/20 0.33
KCNH2 Q12809 1/20 0.33
HDAC1 Q13547 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26478764 0.91 OPRM1 (0.41) OPRM1NPSR1CYP3A4CYP2C9CYP2C19
SCHEMBL26478683 0.88 PTPN2 (0.41) OPRM1NPSR1TACR1ALDH1A1GAA
SCHEMBL24944093 0.88 OPRM1 (0.43) OPRM1TACR1MAPTNPC1HPGD
SCHEMBL26478639 0.87 GSTA1 (0.43) OPRM1NPSR1CYP2C9CYP2C19ALDH1A1
SCHEMBL26478780 0.86 POLB (0.42) OPRM1NPSR1CYP3A4CYP2C9CYP2C19
SCHEMBL24943684 0.86 OPRM1 (0.41) OPRM1TACR1MAPT
SCHEMBL26478686 0.85 OPRM1 (0.40) OPRM1NPSR1TACR1ALDH1A1MAPT
SCHEMBL24944284 0.85 OPRM1 (0.45) OPRM1TACR1SMN1; SMN2KMT2AHDAC1
SCHEMBL24944852 0.85 OPRM1 (0.47) OPRM1NPSR1CYP3A4CYP2C9CYP2C19
SCHEMBL26478641 0.84 ALDH1A1 (0.39) OPRM1NPSR1TACR1ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885NPSR1 2668/4885CYP3A4 4746/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.