SCHEMBL24944859

SCHEMBL24944859

Cc1cccc(C(=O)OC2(c3ccccc3)CCNCC2)c1C

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 3/20 0.44
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
ATM Q13315 1/20 0.36
P2RX7 Q99572 3/20 0.36
TDP1 Q9NUW8 2/20 0.36
AKR1B10 O60218 1/20 0.36
TRPA1 O75762 1/20 0.36
ABCB11 O95342 1/20 0.36
DHFR P00374 1/20 0.36
LMNA P02545 1/20 0.36
MPO P05164 1/20 0.36
CYP1A2 P05177 1/20 0.36
CYP3A4 P08684 1/20 0.36
CHRM1 P11229 1/20 0.36
CYP2C9 P11712 1/20 0.36
AKR1B1 P15121 1/20 0.36
PTGS1 P23219 1/20 0.36
PTGS2 P35354 1/20 0.36
AKR1C3 P42330 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944852 0.91 OPRM1 (0.47) OPRM1MEN1KMT2AP2RX7CYP3A4
SCHEMBL24944854 0.89 HPGD (0.44) OPRM1MEN1KMT2ACYP3A4CYP2C9
SCHEMBL26478756 0.88 OPRM1 (0.45) OPRM1P2RX7LMNATACR1SCN1A
SCHEMBL26478767 0.88 OPRM1 (0.42) OPRM1P2RX7CYP3A4CYP2C9POLB
SCHEMBL26413498 0.88 OPRM1 (0.42) OPRM1MEN1KMT2ALMNACYP1A2
SCHEMBL24943681 0.88 OPRM1 (0.42) OPRM1P2RX7PTGS2POLB
SCHEMBL24944861 0.87 OPRM1 (0.48) OPRM1P2RX7TACR1
SCHEMBL24944652 0.86 SIGMAR1 (0.42) OPRM1MEN1KMT2A
SCHEMBL24944277 0.84 KDM4E (0.42) OPRM1TDP1LMNACYP1A2CYP2C9
SCHEMBL24944654 0.84 OPRM1 (0.41) OPRM1TACR1SCN1ASCN2ASCN3A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885MEN1 3578/4885KMT2A 1033/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.