SCHEMBL24944858

SCHEMBL24944858

Cc1ccc(C(=O)OC2(c3ccccc3)CCNCC2)c(C)c1

nearest known ligand 0.43

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 3/20 0.43
NFE2L2 Q16236 1/20 0.42
KMT2A Q03164 2/20 0.42
MEN1 O00255 1/20 0.42
NPC1 O15118 4/20 0.40
RAB9A P51151 4/20 0.40
TNF P01375 1/20 0.38
PKM P14618 1/20 0.38
CDK5 Q00535 1/20 0.38
KLF5 Q13887 1/20 0.38
CDK5R1 Q15078 1/20 0.38
NOD1 Q9Y239 1/20 0.38
HSD11B1 P28845 1/20 0.38
TACR1 P25103 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.36
MAPT P10636 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944093 0.90 OPRM1 (0.43) OPRM1NFE2L2KMT2AMEN1NPC1
SCHEMBL26413482 0.89 OPRM1 (0.42) OPRM1KMT2AMEN1NPC1RAB9A
SCHEMBL24943691 0.88 OPRM1 (0.41) OPRM1KMT2AMEN1NPC1RAB9A
SCHEMBL26478772 0.88 OPRM1 (0.44) OPRM1NPC1RAB9APKMTACR1
SCHEMBL26478764 0.88 OPRM1 (0.41) OPRM1NPC1RAB9ATACR1MAPT
SCHEMBL24944284 0.87 OPRM1 (0.45) OPRM1KMT2ATACR1SMN1; SMN2
SCHEMBL24944852 0.87 OPRM1 (0.47) OPRM1KMT2AMEN1NPC1RAB9A
SCHEMBL26413484 0.86 CSNK2A1 (0.43) OPRM1KMT2AMEN1NPC1RAB9A
SCHEMBL26478777 0.85 OPRM1 (0.44) OPRM1TACR1SMN1; SMN2MAPT
SCHEMBL26413497 0.85 P2RX7 (0.44) OPRM1KMT2AMEN1NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885NFE2L2 3379/4885KMT2A 1033/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.