SCHEMBL24944890

SCHEMBL24944890

COc1cc(CCC(=O)OC2(c3ccccc3)CCNCC2)ccc1O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 3/20 0.50
OR51E2 Q9H255 1/20 0.49
TRPV1 Q8NER1 3/20 0.47
CHRM5 P08912 1/20 0.47
CHRM1 P11229 1/20 0.47
CHRM3 P20309 1/20 0.47
GAA P10253 2/20 0.47
POLB P06746 1/20 0.47
CYP1A2 P05177 1/20 0.44
CYP3A4 P08684 1/20 0.44
CYP2C8 P10632 1/20 0.44
CYP2C9 P11712 1/20 0.44
CYP2B6 P20813 1/20 0.44
CYP2C19 P33261 1/20 0.44
TSHR P16473 2/20 0.43
ALDH1A1 P00352 1/20 0.43
NFKB1 P19838 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
TAAR1 Q96RJ0 2/20 0.42
MAPK1 P28482 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943718 0.92 CHRM5 (0.56) ALOX5CHRM5CHRM1CHRM3ALDH1A1
SCHEMBL24944048 0.89 GAA (0.51) ALOX5OR51E2TRPV1GAACYP1A2
SCHEMBL24944891 0.83 GAA (0.49) ALOX5OR51E2TRPV1GAATSHR
SCHEMBL24944317 0.82 OPRM1 (0.40) TRPV1CHRM5CHRM1CHRM3TDP1
SCHEMBL26413844 0.81 HPGD (0.41) TRPV1CHRM5CHRM1CHRM3LMNA
SCHEMBL24944045 0.81 OPRM1 (0.45) CHRM5CHRM1CHRM3GAAALDH1A1
SCHEMBL24943732 0.81 GAA (0.51) CHRM5CHRM1CHRM3GAACYP1A2
SCHEMBL24944476 0.81 ALOX5 (0.51) ALOX5CHRM5CHRM1CHRM3GAA
SCHEMBL26413647 0.79 HTT (0.48) GAAPOLBCYP1A2ALDH1A1
SCHEMBL24944681 0.79 OPRM1 (0.40) CHRM5CHRM1CHRM3TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR ALOX5 2213/4885OR51E2 4234/4885TRPV1 2776/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.