SCHEMBL2494847

SCHEMBL2494847

O=C(Oc1ccccc1)c1ccc(C2=NC(c3ccc(Cl)cc3Cl)(C3(c4ccc(Cl)cc4Cl)N=C(c4ccc(C(=O)Oc5ccccc5)cc4)C(c4ccc(C(=O)Oc5ccccc5)cc4)=N3)N=C2c2ccc(C(=O)Oc3ccccc3)cc2)cc1

nearest known ligand 0.50

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.41
ALOX15 P16050 1/20 0.41
ALDH1A1 P00352 2/20 0.40
MAPT P10636 2/20 0.40
MEN1 O00255 2/20 0.39
HTT P42858 1/20 0.38
KDM4E B2RXH2 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
RXFP1 Q9HBX9 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2495232 0.88 PARP10 (0.41) KMT2AALOX15ALDH1A1MAPTMEN1
SCHEMBL8429516 0.86 MAPT (0.41) KMT2AALOX15ALDH1A1MAPTMEN1
SCHEMBL8665865 0.83 MAP2K4 (0.48) KMT2AALDH1A1MAPTMEN1KDM4E
SCHEMBL2494927 0.80 MAPT (0.55) MAPTKDM4ENPSR1
SCHEMBL2494165 0.78 MAPT (0.42) KMT2AALDH1A1MAPTMEN1
SCHEMBL2496334 0.78 PARP10 (0.41) KMT2AALDH1A1MAPTMEN1
SCHEMBL1869270 0.77 MGAM (0.38) ALDH1A1MAPTKDM4E
SCHEMBL8667367 0.76 KMT2A (0.46) KMT2AALDH1A1MAPTMEN1KDM4E
SCHEMBL2492052 0.76 MAPT (0.41) KMT2AALDH1A1MAPTMEN1
SCHEMBL2497219 0.76 PARP10 (0.40) KMT2AALDH1A1MAPTMEN1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9068082-B2 Colored curable composition and color filter FUJIFILM CORPORATION (JP) 2015-06-30 US disclosed
US-20150108086-A1 COLORED CURABLE COMPOSITION AND COLOR FILTER FUJIFILM CORPORATION (JP) 2015-04-23 US disclosed
US-8029877-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2011-10-04 US disclosed
US-20100238388-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL DAI NIPPON PRINTING CO., LTD. (JP) 2010-09-23 US disclosed
US-7758930-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2010-07-20 US disclosed
US-20090202749-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL HAYASHI SHINJI 2009-08-13 US disclosed
US-7537810-B2 Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel DAI NIPPON PRINTING CO., LTD. (JP) 2009-05-26 US disclosed
US-20060229376-A1 Curable resin composition, photosensitive pattern-forming curable resin composition,color filter, substrate for liquid crystalline panel, and liquid crystalline panel DAI NIPPON PRINTING CO., LTD. (JP) 2006-10-12 US disclosed
US-5866298-A Radiation sensitive composition for color filters JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1999-02-02 US disclosed
US-5792589-A ORGANIC BINDER; OPTICALLY CROSSLINKABLE COMPOUND; RADICAL-GENERATING AGENT: 2,4,5-TRIARYL IMIDAZOLE DIMER, AMINO-GROUP CONTAINING BENZOPHENONE PHOTOSENSITIZER, A THIOL COMPOUND JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-08-11 US disclosed
EP-0775941-A1 Radiation sensitive composition for color filters JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-05-28 EP disclosed