SCHEMBL2495381

SCHEMBL2495381

Cc1ccc[n+](C)c1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL8748601 0.97 KMT2A (0.38)
Bromide SCHEMBL28737975 0.97 KMT2A (0.38)
Fluoride Ion SCHEMBL12474470 0.97 KMT2A (0.38)
Hydrochloric Acid SCHEMBL6267344 0.97 KMT2A (0.38)
Bromide SCHEMBL30517303 0.97 KMT2A (0.38)
SCHEMBL1787783 0.91 ACHE (0.37)
Perchlorate SCHEMBL9052014 0.89 KDM4E (0.34)
Iodide SCHEMBL9052632 0.89 RAB9A (0.38)
Sulfuric Acid SCHEMBL5598588 0.87 KDM4E (0.33)
SCHEMBL11598710 0.85 CCR1 (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 113 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111467263-A Skin care lotion with antioxidant effect 杭州全达优护理用品科技有限公司 2020-07-31 CN claimed
EP-0039842-A1 Improvements in or relating to smoking compositions PHILIP MORRIS INCORPORATED (US) 1981-11-18 EP claimed
US-20260118765-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2026-04-30 US disclosed
US-12601972-B2 Resist underlayer film-forming composition with suppressed degeneration of crosslinking agent NISSAN CHEMICAL CORPORATION (JP) 2026-04-14 US disclosed
US-20250383600-A1 BENZENESULFONIC ACID SALT COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-12-18 US disclosed
EP-4664196-A2 BENZENESULFONIC ACID SALT COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-12-17 EP disclosed
US-12454694-B2 Compositions and methods for improving base editing BEAM THERAPEUTICS INC. (US) 2025-10-28 US disclosed
CN-118085600-B Trimethyl pyridinium cyanine dye, preparation method and application thereof 大连理工大学 2025-10-21 CN disclosed
US-20250179483-A1 GENOME EDITING COMPOSITIONS AND METHODS FOR TREATMENT OF GLYCOGEN STORAGE DISEASE TYPE 1B PRIME MEDICINE, INC. 2025-06-05 US disclosed
US-12214055-B2 Systems and methods for treating hyper-igm syndrome EDITAS MEDICINE INC. 2025-02-04 US disclosed
US-20250004367-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2025-01-02 US disclosed
US-5028601-A Substituted with an amino thiazole group and a dihydroxy-pyridone group MEIJI SAIKA KAISHA, LTD. (JP) 1991-07-02 US disclosed
US-4996320-A Thyroid inhibitors SAGAMI CHEMICAL RESEARCH CENTER (JP) 1991-02-26 US disclosed
US-4971961-A ANTIBIOTICS AS BACTERICIDES AGAINST PSEUDOMONAS MEIJI SEIKA KAISHA, LTD. (JP) 1990-11-20 US disclosed
EP-0315997-A2 Cephalosporin compounds and antibacterial agents MEIJI SEIKA KAISHA LTD. (JP) 1989-05-17 EP disclosed
EP-0289002-A2 Novel cephalosporin compounds and antibacterial agents MEIJI SEIKA KAISHA LTD. (JP) 1988-11-02 EP disclosed
US-4758557-A Cephalosporin derivatives and bactericides containing the same MEIJI SEIKA KAISHA, LTD. (JP) 1988-07-19 US disclosed
EP-0209751-A2 Cephalosporin derivatives and bactericides containing the same MEIJI SEIKA KAISHA LTD. (JP) 1987-01-28 EP disclosed
EP-0204535-A1 N-fluoropyridinium salt and process for preparing same SAGAMI CHEMICAL RESEARCH CENTER (JP) 1986-12-10 EP disclosed
US-4093522-A WITH WATER SOLUBLE PYRIDINIUM, QUINOLINIUM OR ACRIDINIUM SULFATE AND HALIDE DILLENBERG HORST 1978-06-06 US disclosed