Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NR4A1 | P22736 | 1/20 | 0.54 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.54 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.54 |
| ▸ | CES2 | O00748 | 2/20 | 0.53 |
| ▸ | CES1 | P23141 | 2/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.53 |
| ▸ | SRD5A2 | P31213 | 2/20 | 0.52 |
| ▸ | CYP1A1 | P04798 | 2/20 | 0.46 |
| ▸ | CYP1B1 | Q16678 | 2/20 | 0.46 |
| ▸ | MAOB | P27338 | 1/20 | 0.46 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.46 |
| ▸ | GSK3B | P49841 | 2/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.44 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.44 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.42 |
| ▸ | NPC1 | O15118 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.41 |
| ▸ | P4HB | P07237 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2698489 | 0.95 | NR4A1 (0.50) | NR4A1NR4A2NR4A3CES2CES1 | |
| SCHEMBL2698488 | 0.95 | NR4A1 (0.50) | NR4A1NR4A2NR4A3CES2CES1 | |
| SCHEMBL14513576 | 0.85 | TSHR (0.48) | ALDH1A1SRD5A2CYP1A2 | |
| SCHEMBL2699146 | 0.83 | PLOD2 (0.46) | CES2CES1ALDH1A1CYP1A1CYP1B1 | |
| SCHEMBL2699148 | 0.83 | PLOD2 (0.46) | CES2CES1ALDH1A1CYP1A1CYP1B1 | |
| SCHEMBL25142331 | 0.83 | CA1 (0.45) | CES2ALDH1A1SRD5A2CYP1A1CYP1B1 | |
| SCHEMBL13864065 | 0.83 | NFE2L2 (0.59) | NR4A1NR4A2NR4A3CES2CES1 | |
| SCHEMBL15113893 | 0.82 | NFE2L2 (0.57) | CES2CES1ALDH1A1KDM4ENPC1 | |
| SCHEMBL2698824 | 0.82 | RXRA (0.45) | NR4A1NR4A2NR4A3ALDH1A1SRD5A2 | |
| SCHEMBL2698826 | 0.82 | RXRA (0.45) | NR4A1NR4A2NR4A3ALDH1A1SRD5A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20230161252-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230152692-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230131303-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230131303-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230120132-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-20 | — | — | US | disclosed |