SCHEMBL25259132

SCHEMBL25259132

O=P(O)(O)Oc1c(Cl)cc(Cl)cc1Cl

nearest known ligand 0.48

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
INPPL1 O15357 11/20 0.48
INPP5A Q14642 6/20 0.47
AKT1 P31749 1/20 0.46
INPP5B P32019 2/20 0.46
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
CA9 Q16790 1/20 0.42
SRC P12931 3/20 0.41
ALDH1A1 P00352 2/20 0.39
CYP3A4 P08684 1/20 0.39
TSHR P16473 1/20 0.39
RECQL P46063 1/20 0.39
HSD17B10 Q99714 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9347214 0.83 INPPL1 (0.45) INPPL1INPP5AAKT1INPP5BCA1
SCHEMBL7594502 0.83 SRC (0.56) INPPL1INPP5AAKT1INPP5BSRC
SCHEMBL11671033 0.81 CA1 (0.45) CA1CA2CA9ALDH1A1CYP3A4
SCHEMBL7766705 0.80 CA1 (0.43) INPPL1INPP5AAKT1INPP5BCA1
SCHEMBL11671318 0.79 INPPL1 (0.39) INPPL1INPP5AAKT1INPP5BCA1
SCHEMBL29359558 0.79 CA1 (0.43) CA1CA2CA9ALDH1A1CYP3A4
SCHEMBL28200207 0.78 CA1 (0.40) CA1CA2CA9ALDH1A1CYP3A4
SCHEMBL4821203 0.78 ALDH1A1 (0.42) INPPL1INPP5AAKT1INPP5BSRC
SCHEMBL25222316 0.77 INPPL1 (0.59) INPPL1INPP5AAKT1INPP5BSRC
SCHEMBL3726092 0.77 TSHR (0.39) CA1CA2CA9ALDH1A1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119775612-A High-temperature-resistant film of battery module and preparation method thereof 赛维精密科技(广东)有限公司 2025-04-08 CN claimed
CN-119775612-A High-temperature-resistant film of battery module and preparation method thereof 赛维精密科技(广东)有限公司 2025-04-08 CN disclosed
US-20230176481-A1 FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-06-08 US disclosed