SCHEMBL252810

SCHEMBL252810

C=CCOc1cccs1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29002822 0.80 KDM4E (0.42)
SCHEMBL28224881 0.80 ALDH1A1 (0.35)
SCHEMBL9430281 0.80 NPC1 (0.32)
SCHEMBL922358 0.76
SCHEMBL6439988 0.75 ALDH1A1 (0.35)
SCHEMBL6007143 0.75 MEN1 (0.31)
SCHEMBL9053559 0.73 HTR1A (0.36)
SCHEMBL922254 0.72
SCHEMBL9031733 0.71
SCHEMBL13221093 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 148 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023153932-A1 ANTIBIOTIC COMPOUNDS, FORMULATIONS AND METHODS OF USE UNIVERSITEIT LEIDEN (NL) 2023-08-17 WO claimed
US-9274378-B2 Alignment film, a method of fabricating the same, and a liquid crystal display using the same SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. (CN) 2016-03-01 US claimed
US-9228130-B2 Alignment film, a method of fabricating the same, and a liquid crystal display using the same SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD (CN) 2016-01-05 US claimed
US-20140375940-A1 Alignment Film, A Method of Fabricating The Same, And A Liquid Crystal Display Using The Same SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. (CN) 2014-12-25 US claimed
US-20140375939-A1 Alignment Film, A Method of Fabricating The Same, and A Liquid Crystal Display Using The Same SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. (CN) 2014-12-25 US claimed
US-12024607-B2 Electric cell potting compound and method of making H.B. FULLER COMPANY (US) 2024-07-02 US disclosed
CN-114127345-B Bicomponent thermoplastic polyurethane fibers and fabrics made therefrom 路博润先进材料公司 2024-05-31 CN disclosed
WO-2024073350-A1 FLAME RETARDANT COMPOSITIONS, COMPOUNDS, AND METHODS OF MAKING H.B. FULLER COMPANY (US) 2024-04-04 WO disclosed
US-11913875-B2 Method for the identification of an incorrectly calibrated or non-calibrated infrared spectrometer EVONIK OPERATIONS GMBH (DE) 2024-02-27 US disclosed
WO-2023153932-A1 ANTIBIOTIC COMPOUNDS, FORMULATIONS AND METHODS OF USE UNIVERSITEIT LEIDEN (NL) 2023-08-17 WO disclosed
WO-2023153932-A1 ANTIBIOTIC COMPOUNDS, FORMULATIONS AND METHODS OF USE UNIVERSITEIT LEIDEN (NL) 2023-08-17 WO disclosed
WO-2023099719-A1 EXPANDABLE PROTECTIVE COATING H. K. WENTWORTH LIMITED (GB) 2023-06-08 WO disclosed
EP-1147115-A2 TRICYCLIC BENZODIAZEPINES AS VASOPRESSIN RECEPTOR ANTAGONISTS Ortho-McNeil Pharmaceutical, Inc. (US) 2001-10-24 EP disclosed
US-6107039-A MIXING SAMPLE OF NUCLEIC ACID SEQUENCE TO BE ANALYZED WITH OLIGONUCLEOTIDE PROBE CONTAINING AT LEAST ONE THIOL-PROTECTED PYRIMIDINE NUCLEOTIDE, EXPOSING TO ENDONUCLEASE, AND IDENTIFYING FRAGMENTS HAVING HYBRIDIZED PROBE THE BOARD OF REGENTS OF THE UNIVERSITY OF OKLAHOMA 2000-08-22 US disclosed
WO-2000043398-A2 TRICYCLIC BENZODIAZEPINES AS VASOPRESSIN RECEPTOR ANTAGONISTS ORTHO-MCNEIL PHARMACEUTICAL, INC. (US) 2000-07-27 WO disclosed
US-6008334-A MODIFIED PYRIMIDINE NUCLEOSIDES/NUCLEOTIDES WITH PROTECTED THIOL GROUP ATTACHED AT 5 POSITION OF BASE THAT IS NOT INVOLVED IN WATSON-CRICK BASE PARING; FOR USE IN CHEMICAL AND ENZYMATIC SYNTHESIS OF NUCLEIC ACIDS THE BOARD OF REGENTS OF THE UNIVERSITY OF OKLAHOMA (US) 1999-12-28 US disclosed
EP-0934330-A1 BASE-PROTECTED NUCLEOTIDE ANALOGS WITH PROTECTED THIOL GROUPS Hanna, Michelle M. (US) 1999-08-11 EP disclosed
WO-1998003532-A9 BASE-PROTECTED NUCLEOTIDE ANALOGS WITH PROTECTED THIOL GROUPS 1998-05-28 WO disclosed
WO-1998003532-A1 BASE-PROTECTED NUCLEOTIDE ANALOGS WITH PROTECTED THIOL GROUPS HANNA MICHELLE M (US) 1998-01-29 WO disclosed
US-5659085-A CHEMICAL AND HEAT RESISTANCE; TRANSPARENCY; STABILITY FUJI XEROX CO., LTD. (JP) 1997-08-19 US disclosed