Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FDPS | P14324 | 5/20 | 0.46 |
| ▸ | SMPD1 | P17405 | 4/20 | 0.39 |
| ▸ | TSHR | P16473 | 3/20 | 0.36 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.33 |
| ▸ | TNNC1 | P63316 | 5/20 | 0.32 |
| ▸ | SGPL1 | O95470 | 1/20 | 0.32 |
| ▸ | S1PR4 | O95977 | 1/20 | 0.32 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.32 |
| ▸ | GPR183 | P32249 | 1/20 | 0.32 |
| ▸ | CERS2 | Q96G23 | 1/20 | 0.32 |
| ▸ | S1PR3 | Q99500 | 1/20 | 0.32 |
| ▸ | S1PR5 | Q9H228 | 1/20 | 0.32 |
| ▸ | GGPS1 | O95749 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.32 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.32 |
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.32 |
| ▸ | PPARG | P37231 | 1/20 | 0.32 |
| ▸ | PPARD | Q03181 | 1/20 | 0.32 |
| ▸ | PPARA | Q07869 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Formic Acid SCHEMBL5346406 | 0.91 | FDPS (0.50) | FDPSSMPD1TSHRGGPS1 | |
| SCHEMBL93609 | 0.84 | FDPS (0.46) | FDPSSMPD1TSHRTNNC1SGPL1 | |
| Bicarbonate SCHEMBL4357070 | 0.82 | FDPS (0.48) | FDPSSMPD1TSHRAKR1B1ALDH1A1 | |
| Methyl Alcohol SCHEMBL22190212 | 0.81 | FDPS (0.46) | FDPSSMPD1TSHRTNNC1SGPL1 | |
| Fluoride SCHEMBL4871826 | 0.81 | FDPS (0.44) | FDPSSMPD1TSHRTNNC1SGPL1 | |
| Hydrochloric Acid SCHEMBL363004 | 0.81 | FDPS (0.44) | FDPSSMPD1TSHRTNNC1SGPL1 | |
| Iodide SCHEMBL553007 | 0.81 | FDPS (0.44) | FDPSSMPD1TSHRTNNC1SGPL1 | |
| Bromide SCHEMBL309594 | 0.81 | FDPS (0.44) | FDPSSMPD1TSHRTNNC1SGPL1 | |
| Water SCHEMBL661747 | 0.81 | FDPS (0.44) | FDPSSMPD1TSHRTNNC1SGPL1 | |
| Acetic Acid SCHEMBL2529015 | 0.80 | FDPS (0.46) | FDPSSMPD1TSHRAKR1B1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8575245-B2 | Tunable polymer compositions | NOVOMER, INC. (US) | 2013-11-05 | — | — | US | claimed |
| US-20110257296-A1 | TUNABLE POLYMER COMPOSITIONS | NOVOMER, INC. (US) | 2011-10-20 | — | — | US | claimed |
| WO-2010075232-A1 | TUNABLE POLYMER COMPOSITIONS | NOVOMER, INC. (US) | 2010-07-01 | — | — | WO | claimed |
| US-8575245-B2 | Tunable polymer compositions | NOVOMER, INC. (US) | 2013-11-05 | — | — | US | disclosed |
| US-20110257296-A1 | TUNABLE POLYMER COMPOSITIONS | NOVOMER, INC. (US) | 2011-10-20 | — | — | US | disclosed |
| WO-2010075232-A1 | TUNABLE POLYMER COMPOSITIONS | NOVOMER, INC. (US) | 2010-07-01 | — | — | WO | disclosed |
| US-20070135565-A1 | COMPOSITION FOR FORMING POROUS FILM, POROUS FILM AND METHOD FOR FORMING THE SAME, INTERLEVEL INSULATOR FILM, AND SEMICONDUCTOR DEVICE | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2007-06-14 | — | — | US | disclosed |
| US-7132473-B2 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-11-07 | — | — | US | disclosed |
| EP-1568744-A1 | COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-08-31 | — | — | EP | disclosed |
| US-20040219372-A1 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-11-04 | — | — | US | disclosed |