SCHEMBL25375883

SCHEMBL25375883

CCC(CO)(CO)CO.Cc1cc(F)ccc1C1CC(=O)CC(=O)C1

nearest known ligand 0.39

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
OPRL1 P41146 10/20 0.39
TACR1 P25103 2/20 0.35
OPRM1 P35372 2/20 0.34
KCNH2 Q12809 2/20 0.34
TP53 P04637 1/20 0.33
RECQL P46063 1/20 0.33
GRM7 Q14831 1/20 0.32
FFAR4 Q5NUL3 1/20 0.32
SLC9A1 P19634 2/20 0.31
SLC9A2 Q9UBY0 2/20 0.31
SLC9A3 P48764 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25375464 0.90 SLC9A1 (0.38) TP53RECQLSLC9A1SLC9A2SLC9A3
SCHEMBL25377118 0.87 OPRL1 (0.40) OPRL1TACR1OPRM1KCNH2TP53
SCHEMBL25374556 0.87 GRM7 (0.43) TP53RECQLGRM7
SCHEMBL30368483 0.85 TP53 (0.42) OPRL1TACR1OPRM1KCNH2TP53
SCHEMBL25377013 0.83 TP53 (0.33) TP53RECQL
SCHEMBL25376749 0.82 TP53 (0.45) TP53RECQL
SCHEMBL25374981 0.80 TP53 (0.38) TP53RECQL
SCHEMBL25375978 0.80 TP53 (0.40) TP53RECQLGRM7
SCHEMBL25373270 0.78 LDHA (0.39) TP53RECQL
SCHEMBL25374797 0.78 RIPK1 (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230399510-A1 THERMOPLASTIC RESIN AND OPTICAL LENS INCLUDING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-12-14 US disclosed
EP-4239010-A1 THERMOPLASTIC RESIN AND OPTICAL LENS INCLUDING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-09-06 EP disclosed
CN-116323753-A Thermoplastic resin and optical lens comprising the same 三菱瓦斯化学株式会社 2023-06-23 CN disclosed
CN-115996931-A Cyclic diol compound, process for producing the compound, and use of the compound 新日本理化株式会社 2023-04-21 CN disclosed