⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2982775 | 0.82 | — | — | |
| SCHEMBL2984973 | 0.82 | — | — | |
| SCHEMBL645070 | 0.82 | CA12 (0.45) | — | |
| SCHEMBL241530 | 0.82 | FAAH (0.43) | — | |
| SCHEMBL1585397 | 0.82 | — | — | |
| SCHEMBL6734553 | 0.81 | LMNA (0.41) | — | |
| SCHEMBL5439857 | 0.80 | — | — | |
| SCHEMBL17860726 | 0.79 | LMNA (0.39) | — | |
| SCHEMBL2988925 | 0.78 | MMP1 (0.52) | — | |
| SCHEMBL8382943 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8044070-B2 | Heteroaryloxy nitrogenous saturated heterocyclic derivative | MSD K.K. (JP) | 2011-10-25 | — | — | US | disclosed |
| US-20100210637-A1 | HETEROARYLOXY NITROGENOUS SATURATED HETEROCYCLIC DERIVATIVE | MSD K.K. (JP) | 2010-08-19 | — | — | US | disclosed |
| US-7595316-B2 | Heteroaryloxy nitrogenous saturated heterocyclic derivative | BANYU PHARMACEUTICAL CO., LTD. (JP) | 2009-09-29 | — | — | US | disclosed |
| US-7482339-B2 | 2-Naphthylimino-1,3-thiazine derivative | SHIONOGI AND CO., LTD. (JP) | 2009-01-27 | — | — | US | disclosed |
| EP-1095935-B1 | 6-Hydroxy-5,6-dihydrouracils as herbicides | SUMITOMO CHEMICAL CO (JP) | 2008-12-17 | — | — | EP | disclosed |
| US-20070254247-A1 | Radiation-sensitive resin composition | YAMAMOTO MASAFUMI | 2007-11-01 | — | — | US | disclosed |
| US-20060281738-A1 | 2-Naphthylimino-1,3-thiazine derivative | SHIONOGI AND CO., LTD. (JP) | 2006-12-14 | — | — | US | disclosed |
| US-20060178375-A1 | Heteroaryloxy nitrogenous saturated heterocyclic derivative | MSD K.K. (JP) | 2006-08-10 | — | — | US | disclosed |
| EP-1659117-A1 | 2-NAPHTHYLIMINO-1,3-THIAZINE DERIVATIVE | SHIONOGI & CO., LTD. (JP) | 2006-05-24 | — | — | EP | disclosed |
| EP-1642898-A1 | HETEROARYLOXY NITROGENOUS SATURATED HETEROCYCLIC DERIVATIVE | BANYU PHARMACEUTICAL CO., LTD. (JP) | 2006-04-05 | — | — | EP | disclosed |
| EP-1095935-A1 | 6-Hydroxy-5,6-dihydrouracils as herbicides | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-05-02 | — | — | EP | disclosed |
| EP-0789279-B1 | Polymer and resist material | WAKO PURE CHEM IND LTD (JP) | 2001-03-21 | — | — | EP | disclosed |
| WO-2000042015-A1 | SUBSTITUTED 2-PHENYLPYRIDINES AS HERBICIDES | BASF AKTIENGESELLSCHAFT (DE) | 2000-07-20 | — | — | WO | disclosed |
| US-6033826-A | POLYHYDROXYSTYRENE DERIVATIVE CONTAINING AN ACETAL OR KETAL GROUP WHICH CAN EASILY BE ELIMINATED IN THE PRESENCE OF AN ACID IN THE MOLECULE AND HAVING A VERY NARROW MOLECULAR WEIGHT DISTRIBUTION GIVES A RESIST MATERIAL | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2000-03-07 | — | — | US | disclosed |
| WO-1998007720-A1 | SUBSTITUTED 2-ARYLPYRIDINE AS HERBICIDE | BASF AKTIENGESELLSCHAFT (DE) | 1998-02-26 | — | — | WO | disclosed |
| EP-0789279-A1 | Polymer and resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1997-08-13 | — | — | EP | disclosed |
| US-5399577-A | Lipoxygenase and cyclooxygenase inhibitor, antiasthma, antiinflammatory | TAIHO PHARMACEUTICAL CO., LTD. (JP) | 1995-03-21 | — | — | US | disclosed |
| EP-0633254-A1 | NOVEL ISOXAZOLE DERIVATIVE AND SALT THEREOF | TAIHO PHARMACEUTICAL CO., LTD. (JP) | 1995-01-11 | — | — | EP | disclosed |
| US-5262385-A | Pyrimidine ring containing | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1993-11-16 | — | — | US | disclosed |
| EP-0468766-A1 | Halogen-containing compounds, herbicidal composition containing the same as an active ingredient, and intermediary compounds therefor | Mitsubishi Chemical Corporation (JP) | 1992-01-29 | — | — | EP | disclosed |