⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5948429 | 0.83 | IDO1 (0.33) | — | |
| SCHEMBL5949082 | 0.82 | IDO1 (0.31) | — | |
| SCHEMBL25419456 | 0.81 | TAAR1 (0.33) | — | |
| SCHEMBL25422771 | 0.81 | CES2 (0.32) | — | |
| SCHEMBL25422263 | 0.80 | CES2 (0.34) | — | |
| SCHEMBL29006499 | 0.80 | IDO1 (0.30) | — | |
| SCHEMBL25419948 | 0.80 | PTGES (0.31) | — | |
| SCHEMBL25422252 | 0.80 | — | — | |
| SCHEMBL5948999 | 0.76 | ERN1 (0.34) | — | |
| SCHEMBL5948787 | 0.76 | IDO1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240122065-A1 | METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN | TOSOH CORPORATION (JP) | 2024-04-11 | — | — | US | disclosed |
| EP-4198163-A1 | METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN | Tosoh Corporation (JP) | 2023-06-21 | — | — | EP | disclosed |