SCHEMBL25422771

SCHEMBL25422771

Oc1c(-c2c(F)c(O)c(F)c(F)c2F)cc(F)c(F)c1O

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
▸ CES2 O00748 1/20 0.32
▸ CES1 P23141 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25422263 0.96 CES2 (0.34) CES2CES1
SCHEMBL25421813 0.89 CES2 (0.33) CES2CES1
SCHEMBL5948424 0.85 PTGES (0.34) CES2CES1
SCHEMBL29006487 0.83 — —
SCHEMBL29006499 0.83 IDO1 (0.30) CES2CES1
SCHEMBL25420787 0.81 — —
SCHEMBL5948429 0.81 IDO1 (0.33) —
SCHEMBL25419948 0.78 PTGES (0.31) —
SCHEMBL25422240 0.78 IDO1 (0.34) —
SCHEMBL29006491 0.78 NQO1 (0.32) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240122065-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN TOSOH CORPORATION (JP) 2024-04-11 — — US disclosed
EP-4198163-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN Tosoh Corporation (JP) 2023-06-21 — — EP disclosed
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