SCHEMBL29006499

SCHEMBL29006499

Oc1c(F)cc(-c2c(F)c(F)c(O)c(F)c2F)c(O)c1O

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
▸ IDO1 P14902 1/20 0.30
▸ CES2 O00748 1/20 0.30
▸ CES1 P23141 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25422993 0.89 IDO1 (0.33) IDO1
SCHEMBL25419948 0.86 PTGES (0.31) IDO1
SCHEMBL25422263 0.86 CES2 (0.34) CES2CES1
SCHEMBL5949082 0.84 IDO1 (0.31) IDO1
SCHEMBL25422771 0.83 CES2 (0.32) CES2CES1
SCHEMBL5948429 0.80 IDO1 (0.33) IDO1
SCHEMBL25419103 0.80 TAAR1 (0.34) IDO1
SCHEMBL25420787 0.80 — —
SCHEMBL5948424 0.79 PTGES (0.34) CES2CES1
SCHEMBL25422240 0.77 IDO1 (0.34) IDO1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116157382-A Material for metal patterning, amine compound, electronic device, and method for forming metal pattern 东曹株式会社 2023-05-23 — — CN disclosed
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