SCHEMBL25422993

SCHEMBL25422993

Oc1c(F)cc(-c2c(O)c(F)c(F)c(F)c2F)c(O)c1O

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ IDO1 P14902 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29006499 0.89 IDO1 (0.30) IDO1
SCHEMBL25423472 0.87 IDO1 (0.33) IDO1
SCHEMBL5948787 0.84 IDO1 (0.33) IDO1
SCHEMBL25421813 0.83 CES2 (0.33) —
SCHEMBL25420886 0.81 IDO1 (0.35) IDO1
SCHEMBL25419557 0.78 — —
SCHEMBL25422771 0.77 CES2 (0.32) —
SCHEMBL25419948 0.76 PTGES (0.31) IDO1
SCHEMBL25422263 0.76 CES2 (0.34) —
SCHEMBL25423348 0.76 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240122065-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN TOSOH CORPORATION (JP) 2024-04-11 — — US disclosed
EP-4198163-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN Tosoh Corporation (JP) 2023-06-21 — — EP disclosed
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