SCHEMBL25469588

SCHEMBL25469588

CC(C)(C)CC(C)(C(=O)Oc1ccc(C(=O)OC2(c3ccccc3)CCCC2)cc1)C(C)(C)C

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 10/20 0.39
▸ MAPT P10636 1/20 0.36
▸ TDP1 Q9NUW8 1/20 0.36
▸ L3MBTL1 Q9Y468 1/20 0.36
▸ SLC6A2 P23975 1/20 0.36
▸ SLC6A4 P31645 1/20 0.36
▸ SLC6A3 Q01959 1/20 0.36
▸ KMT2A Q03164 2/20 0.35
▸ MEN1 O00255 1/20 0.35
▸ CYP1A2 P05177 1/20 0.35
▸ CYP3A4 P08684 1/20 0.35
▸ CYP2D6 P10635 1/20 0.35
▸ CYP2C9 P11712 1/20 0.35
▸ CYP2C19 P33261 1/20 0.35
▸ SMN1; SMN2 Q16637 1/20 0.35
▸ NPSR1 Q6W5P4 1/20 0.35
▸ ADORA3 P0DMS8 1/20 0.34
▸ PRTN3 P24158 3/20 0.33
▸ ALDH1A1 P00352 1/20 0.33
▸ PARP10 Q53GL7 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23762997 0.84 APOBEC3A (0.38) KMT2AMEN1SMN1; SMN2ALDH1A1DRD3
SCHEMBL25468053 0.84 ELANE (0.42) ELANEMAPTTDP1L3MBTL1SLC6A2
SCHEMBL24197480 0.83 APOBEC3A (0.37) SLC6A2SLC6A4SLC6A3KMT2AMEN1
SCHEMBL10250059 0.76 ELANE (0.46) ELANEMAPTTDP1L3MBTL1KMT2A
SCHEMBL4580279 0.76 AKR1C1 (0.46) TDP1L3MBTL1KMT2AMEN1CYP1A2
SCHEMBL25699034 0.75 ELANE (0.56) ELANEMAPTTDP1L3MBTL1SLC6A2
SCHEMBL25834166 0.74 CYP2C9 (0.42) KMT2AMEN1CYP1A2CYP3A4CYP2D6
SCHEMBL25513876 0.73 MAPT (0.33) MAPTKMT2AMEN1SMN1; SMN2NPSR1
SCHEMBL27593585 0.73 LMNA (0.48) TDP1KMT2AMEN1CYP1A2CYP3A4
SCHEMBL25834165 0.73 CYP2C9 (0.41) KMT2AMEN1CYP1A2CYP3A4CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230148344-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND FUJIFILM CORPORATION (JP) 2023-05-11 — — US disclosed
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