Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | APOBEC3A | P31941 | 3/20 | 0.38 |
| ▸ | APOBEC3G | Q9HC16 | 3/20 | 0.38 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.37 |
| ▸ | OPRM1 | P35372 | 3/20 | 0.36 |
| ▸ | OPRD1 | P41143 | 3/20 | 0.36 |
| ▸ | OPRK1 | P41145 | 3/20 | 0.36 |
| ▸ | DRD3 | P35462 | 2/20 | 0.35 |
| ▸ | PRCP | P42785 | 1/20 | 0.34 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.34 |
| ▸ | HDAC4 | P56524 | 2/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.34 |
| ▸ | POLB | P06746 | 2/20 | 0.34 |
| ▸ | HTT | P42858 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24197480 | 0.99 | APOBEC3A (0.37) | APOBEC3AAPOBEC3GAKR1C1OPRM1OPRD1 | |
| SCHEMBL25513876 | 0.88 | MAPT (0.33) | OPRM1DRD3ALDH1A1SMN1; SMN2MEN1 | |
| SCHEMBL26152082 | 0.87 | ADORA3 (0.34) | OPRM1DRD3ALDH1A1SMN1; SMN2MEN1 | |
| SCHEMBL25469588 | 0.84 | ELANE (0.39) | DRD3ALDH1A1SMN1; SMN2MEN1KMT2A | |
| SCHEMBL22168544 | 0.81 | AKR1C1 (0.44) | APOBEC3AAPOBEC3GAKR1C1OPRM1OPRD1 | |
| SCHEMBL13346700 | 0.80 | OPRM1 (0.38) | APOBEC3AAPOBEC3GAKR1C1OPRM1OPRD1 | |
| SCHEMBL25574954 | 0.80 | AKR1C1 (0.43) | APOBEC3AAPOBEC3GAKR1C1OPRM1OPRD1 | |
| SCHEMBL13346697 | 0.79 | ADORA3 (0.39) | APOBEC3AAPOBEC3GAKR1C1OPRM1OPRD1 | |
| SCHEMBL21012168 | 0.79 | AKR1C1 (0.40) | APOBEC3AAPOBEC3GAKR1C1OPRM1OPRD1 | |
| SCHEMBL13346710 | 0.79 | OPRM1 (0.44) | APOBEC3AAPOBEC3GAKR1C1OPRM1OPRD1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230161256-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20220011668-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2022-01-13 | — | — | US | disclosed |
| US-20210371377-A1 | CARBOXYLATE, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-12-02 | — | — | US | disclosed |
| US-20210311392-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-10-07 | — | — | US | disclosed |
| US-20210286260-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-09-16 | — | — | US | disclosed |
| US-20210255545-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-08-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210371377-A1 | CARBOXYLATE, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | CHRM1, CHRM2, FOXM1 | APOBEC3A 1597/4885APOBEC3G 1472/4885AKR1C1 402/4885 |
| US-20210255545-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | FGFR1, RER1, FGF1 | APOBEC3A 4011/4885APOBEC3G 3790/4885AKR1C1 174/4885 |
| US-20220011668-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | H1-0, H1-10, CHRM1 | APOBEC3A 3372/4885APOBEC3G 3006/4885AKR1C1 299/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.