SCHEMBL25834166

SCHEMBL25834166

CCC(C)(C)c1ccc(C(=O)OC2(c3ccccc3)CCCC2)cc1

nearest known ligand 0.42

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP2C9 P11712 2/20 0.42
MEN1 O00255 1/20 0.42
CYP1A2 P05177 1/20 0.42
CYP3A4 P08684 1/20 0.42
CYP2D6 P10635 1/20 0.42
CYP2C19 P33261 1/20 0.42
KMT2A Q03164 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
NPC1 O15118 1/20 0.41
POLB P06746 1/20 0.41
RAB9A P51151 1/20 0.41
ADORA3 P0DMS8 1/20 0.38
DRD3 P35462 1/20 0.38
OPRM1 P35372 3/20 0.37
OPRD1 P41143 3/20 0.37
OPRK1 P41145 3/20 0.37
HRH3 Q9Y5N1 8/20 0.37
LMNA P02545 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25834165 0.99 CYP2C9 (0.41) CYP2C9MEN1CYP1A2CYP3A4CYP2D6
SCHEMBL25903121 0.89 ADORA3 (0.38) CYP2C9SMN1; SMN2NPSR1NPC1POLB
SCHEMBL25903119 0.86 LMNA (0.44) MEN1KMT2ASMN1; SMN2NPSR1POLB
SCHEMBL4580279 0.82 AKR1C1 (0.46) CYP2C9MEN1CYP1A2CYP3A4CYP2D6
SCHEMBL25468053 0.81 ELANE (0.42) CYP2C9MEN1CYP1A2CYP3A4CYP2D6
SCHEMBL29319752 0.80 MAOB (0.40) CYP2C9MEN1CYP1A2CYP3A4CYP2D6
SCHEMBL25468056 0.80 CYP2C9 (0.39) CYP2C9MEN1CYP1A2CYP3A4CYP2D6
SCHEMBL27593585 0.79 LMNA (0.48) CYP2C9MEN1CYP1A2CYP3A4CYP2D6
SCHEMBL14713746 0.79 CYP2C9 (0.39) CYP2C9MEN1CYP1A2CYP3A4CYP2D6
SCHEMBL4580283 0.78 AKR1C1 (0.42) CYP2C9MEN1CYP1A2CYP3A4CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230236502-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-07-27 US disclosed
US-20230236502-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-07-27 US disclosed
US-11693313-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2023-07-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11693313-B2 Resist composition and method of forming resist pattern C1R, C1S, C9 CYP2C9 1002/4885MEN1 1250/4885CYP1A2 248/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.