SCHEMBL25470000

SCHEMBL25470000

CC(C)CC(C)C(=O)Oc1ccccc1I

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ FABP7 O15540 1/20 0.39
▸ FABP3 P05413 1/20 0.39
▸ FABP5 Q01469 1/20 0.39
▸ ALDH1A1 P00352 3/20 0.38
▸ TSHR P16473 2/20 0.38
▸ ANPEP P15144 2/20 0.35
▸ CA12 O43570 1/20 0.35
▸ CA2 P00918 1/20 0.35
▸ CA7 P43166 1/20 0.35
▸ CA9 Q16790 1/20 0.35
▸ CA14 Q9ULX7 1/20 0.35
▸ HTT P42858 2/20 0.35
▸ KDM4E B2RXH2 2/20 0.35
▸ HSD17B10 Q99714 1/20 0.35
▸ ACHE P22303 1/20 0.34
▸ FOLH1 Q04609 2/20 0.34
▸ HPGD P15428 1/20 0.33
▸ KMT2A Q03164 1/20 0.33
▸ L3MBTL1 Q9Y468 1/20 0.33
▸ CTSK P43235 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25519396 0.85 KMT2A (0.43) FABP7FABP3FABP5ALDH1A1TSHR
SCHEMBL25522016 0.84 FABP7 (0.38) FABP7FABP3FABP5ALDH1A1TSHR
SCHEMBL27996039 0.81 ELANE (0.46) FABP7FABP3FABP5ALDH1A1TSHR
SCHEMBL23867037 0.80 FABP7 (0.43) FABP7FABP3FABP5ALDH1A1TSHR
SCHEMBL7326080 0.78 FABP7 (0.42) FABP7FABP3FABP5ALDH1A1TSHR
SCHEMBL2296618 0.76 ELANE (0.49) ALDH1A1TSHRANPEPCA12CA2
SCHEMBL27620015 0.75 FABP7 (0.45) FABP7FABP3FABP5ALDH1A1TSHR
SCHEMBL4246889 0.74 ELANE (0.46) FABP7FABP3FABP5ALDH1A1KDM4E
SCHEMBL28540876 0.74 FABP7 (0.44) FABP7FABP3FABP5ALDH1A1TSHR
SCHEMBL29435434 0.74 ELANE (0.46) FABP7FABP3FABP5ALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230148344-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND FUJIFILM CORPORATION (JP) 2023-05-11 — — US disclosed
Send feedback