SCHEMBL25522016

SCHEMBL25522016

CC(C)CC(C(=O)Oc1ccccc1I)C(C)C

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ FABP7 O15540 1/20 0.38
▸ FABP3 P05413 1/20 0.38
▸ FABP5 Q01469 1/20 0.38
▸ ALDH1A1 P00352 3/20 0.36
▸ TSHR P16473 2/20 0.36
▸ ANPEP P15144 5/20 0.34
▸ ALOX15 P16050 1/20 0.34
▸ HTT P42858 2/20 0.33
▸ KDM4E B2RXH2 1/20 0.33
▸ HSD17B10 Q99714 1/20 0.33
▸ MMP2 P08253 2/20 0.33
▸ MMP9 P14780 2/20 0.33
▸ LTA4H P09960 2/20 0.33
▸ LAP3 P28838 1/20 0.33
▸ NPEPPS P55786 1/20 0.33
▸ ERAP2 Q6P179 1/20 0.33
▸ ERAP1 Q9NZ08 1/20 0.33
▸ ACHE P22303 1/20 0.33
▸ FOLH1 Q04609 1/20 0.32
▸ HPGD P15428 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25470000 0.84 FABP7 (0.39) FABP7FABP3FABP5ALDH1A1TSHR
SCHEMBL27996039 0.79 ELANE (0.46) FABP7FABP3FABP5ALDH1A1TSHR
SCHEMBL19573301 0.78 ATM (0.50) ALDH1A1TSHRANPEPLAP3
SCHEMBL23867037 0.77 FABP7 (0.43) FABP7FABP3FABP5ALDH1A1TSHR
SCHEMBL25519396 0.76 KMT2A (0.43) FABP7FABP3FABP5ALDH1A1TSHR
SCHEMBL7326080 0.76 FABP7 (0.42) FABP7FABP3FABP5ALDH1A1TSHR
SCHEMBL25522015 0.74 MEN1 (0.34) HTTACHE
SCHEMBL27620015 0.73 FABP7 (0.45) FABP7FABP3FABP5ALDH1A1TSHR
SCHEMBL28540876 0.72 FABP7 (0.44) FABP7FABP3FABP5ALDH1A1TSHR
SCHEMBL4246889 0.72 ELANE (0.46) FABP7FABP3FABP5ALDH1A1ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230168581-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-06-01 — — US disclosed
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