SCHEMBL25519396

SCHEMBL25519396

CCC(C)C(=O)Oc1ccccc1I

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 4/20 0.43
▸ KDM4E B2RXH2 3/20 0.43
▸ L3MBTL1 Q9Y468 2/20 0.43
▸ FABP7 O15540 1/20 0.40
▸ FABP3 P05413 1/20 0.40
▸ FABP5 Q01469 1/20 0.40
▸ POLB P06746 1/20 0.36
▸ APEX1 P27695 1/20 0.36
▸ ATM Q13315 1/20 0.36
▸ MEN1 O00255 2/20 0.36
▸ RECQL P46063 1/20 0.36
▸ FFAR1 O14842 1/20 0.35
▸ ALDH1A1 P00352 4/20 0.35
▸ TSHR P16473 4/20 0.35
▸ ACHE P22303 1/20 0.35
▸ NPSR1 Q6W5P4 1/20 0.34
▸ GLA P06280 1/20 0.34
▸ MAPT P10636 1/20 0.34
▸ TDP1 Q9NUW8 2/20 0.34
▸ HTT P42858 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15548526 0.88 KMT2A (0.49) KMT2AKDM4EL3MBTL1POLBAPEX1
SCHEMBL25470000 0.85 FABP7 (0.39) KMT2AKDM4EL3MBTL1FABP7FABP3
SCHEMBL27996039 0.82 ELANE (0.46) KMT2AKDM4EFABP7FABP3FABP5
SCHEMBL4090840 0.81 TDP1 (0.48) KMT2AKDM4EL3MBTL1ATMALDH1A1
SCHEMBL17459128 0.81 L3MBTL1 (0.44) KMT2AKDM4EL3MBTL1POLBAPEX1
SCHEMBL27721743 0.81 KMT2A (0.44) KMT2AKDM4EL3MBTL1POLBMEN1
SCHEMBL15547525 0.81 PTGS2 (0.47) KMT2AKDM4EL3MBTL1MEN1ALDH1A1
SCHEMBL15547890 0.81 ALOX15 (0.47) KMT2AKDM4EL3MBTL1POLBAPEX1
SCHEMBL4085152 0.81 KMT2A (0.49) KMT2AKDM4EL3MBTL1POLBATM
SCHEMBL23867037 0.81 FABP7 (0.43) KMT2AKDM4EFABP7FABP3FABP5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230259029-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-08-17 — — US disclosed
US-20230168581-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-06-01 — — US disclosed
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