SCHEMBL25475322

SCHEMBL25475322

CN1CCC(OC(=O)CS)CC1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.51
SMN1; SMN2 Q16637 2/20 0.50
RAB9A P51151 1/20 0.50
MAPT P10636 1/20 0.50
SCN1A P35498 5/20 0.46
SCN2A Q99250 5/20 0.46
SCN3A Q9NY46 5/20 0.46
KMT2A Q03164 2/20 0.46
MEN1 O00255 1/20 0.46
CHRM3 P20309 3/20 0.45
CHRM1 P11229 2/20 0.45
CHRM4 P08173 1/20 0.45
CHRM5 P08912 1/20 0.45
TP53 P04637 1/20 0.42
ATM Q13315 1/20 0.41
MLNR O43193 1/20 0.40
CHRM2 P08172 1/20 0.40
HTR2A P28223 1/20 0.40
HTR2C P28335 1/20 0.40
HRH1 P35367 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25475217 0.85 ALDH1A1 (0.49) ALDH1A1SMN1; SMN2RAB9AMAPTSCN1A
SCHEMBL23004635 0.82 ALDH1A1 (0.53) ALDH1A1SMN1; SMN2RAB9AMAPTSCN1A
SCHEMBL16897737 0.82 ALDH1A1 (0.53) ALDH1A1SMN1; SMN2RAB9AMAPTSCN1A
SCHEMBL331246 0.81 TSHR (0.42) ALDH1A1SMN1; SMN2RAB9AMAPT
SCHEMBL15921260 0.81
SCHEMBL2005308 0.81 ALDH1A1 (0.51) ALDH1A1SMN1; SMN2RAB9AMAPTSCN1A
SCHEMBL20954287 0.79 ALDH1A1 (0.50) ALDH1A1SMN1; SMN2RAB9AMAPTSCN1A
Hydrochloric Acid SCHEMBL10968581 0.79 ALDH1A1 (0.54) ALDH1A1SMN1; SMN2RAB9AMAPTSCN1A
SCHEMBL5844533 0.79 ALDH1A1 (0.50) ALDH1A1SMN1; SMN2RAB9AMAPTSCN1A
SCHEMBL27826248 0.79 SMN1; SMN2 (0.61) ALDH1A1SMN1; SMN2RAB9AMAPTSCN1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161255-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161255-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed