SCHEMBL25475531

SCHEMBL25475531

CCOC(=O)c1c(C)c(I)c(I)c(C)c1C(=O)O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 9/20 0.50
▸ USP2 O75604 1/20 0.49
▸ HPGD P15428 6/20 0.44
▸ MAPT P10636 5/20 0.44
▸ SMN1; SMN2 Q16637 5/20 0.44
▸ GAA P10253 2/20 0.44
▸ CA12 O43570 1/20 0.44
▸ CA1 P00915 1/20 0.44
▸ CA2 P00918 1/20 0.44
▸ CA7 P43166 1/20 0.44
▸ CA9 Q16790 1/20 0.44
▸ CA14 Q9ULX7 1/20 0.44
▸ KMT2A Q03164 3/20 0.43
▸ NR1H2 P55055 1/20 0.43
▸ NR1H3 Q13133 1/20 0.43
▸ MAPK1 P28482 2/20 0.42
▸ NPC1 O15118 2/20 0.42
▸ RAB9A P51151 2/20 0.42
▸ PDE4D Q08499 1/20 0.42
▸ FHIT P49789 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27744428 0.89 ALDH1A1 (0.47) ALDH1A1USP2HPGDMAPTSMN1; SMN2
SCHEMBL19678522 0.82 ALDH1A1 (0.47) ALDH1A1USP2HPGDMAPTSMN1; SMN2
SCHEMBL25475535 0.80 LMNA (0.42) ALDH1A1HPGDCA12CA1CA2
SCHEMBL29153995 0.79 ALDH1A1 (0.55) ALDH1A1USP2HPGDMAPTSMN1; SMN2
SCHEMBL31581362 0.79 ALDH1A1 (0.55) ALDH1A1USP2HPGDMAPTSMN1; SMN2
SCHEMBL29201220 0.79 ALDH1A1 (0.55) ALDH1A1USP2HPGDMAPTSMN1; SMN2
SCHEMBL25379723 0.79 ALDH1A1 (0.55) ALDH1A1USP2HPGDMAPTSMN1; SMN2
SCHEMBL25380338 0.79 ALDH1A1 (0.55) ALDH1A1USP2HPGDMAPTSMN1; SMN2
SCHEMBL25380339 0.79 ALDH1A1 (0.55) ALDH1A1USP2HPGDMAPTSMN1; SMN2
SCHEMBL9397467 0.79 ALDH1A1 (0.58) ALDH1A1USP2HPGDMAPTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161255-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-20230161255-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
Send feedback