SCHEMBL25475532

SCHEMBL25475532

Cc1c(I)c(I)c(C)c(C(=O)OC2CCCCC2)c1C(=O)O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TDP1 Q9NUW8 1/20 0.39
▸ ALDH1A1 P00352 4/20 0.38
▸ TSHR P16473 3/20 0.38
▸ NPSR1 Q6W5P4 2/20 0.38
▸ HSD17B10 Q99714 2/20 0.36
▸ HPGD P15428 1/20 0.36
▸ MMP9 P14780 2/20 0.36
▸ MMP12 P39900 2/20 0.36
▸ TP53 P04637 1/20 0.36
▸ MMP1 P03956 1/20 0.36
▸ SMN1; SMN2 Q16637 6/20 0.36
▸ NPC1 O15118 3/20 0.36
▸ RAB9A P51151 3/20 0.36
▸ HTT P42858 2/20 0.36
▸ EPHX1 P07099 2/20 0.36
▸ MMP2 P08253 1/20 0.35
▸ ALOX15 P16050 1/20 0.35
▸ MAPK1 P28482 1/20 0.35
▸ MAPK10 P53779 1/20 0.35
▸ STS P08842 3/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19678545 0.82 MMP9 (0.39) TDP1NPSR1MMP9MMP12TP53
SCHEMBL25475535 0.72 LMNA (0.42) ALDH1A1TSHRNPSR1HPGDHTT
SCHEMBL6707429 0.72 ATM (0.44) TDP1ALDH1A1NPSR1HSD17B10HPGD
SCHEMBL25475531 0.69 ALDH1A1 (0.50) TDP1ALDH1A1NPSR1HSD17B10HPGD
SCHEMBL9485184 0.69 MMP9 (0.42) NPSR1MMP9MMP12MMP1SMN1; SMN2
SCHEMBL10782468 0.69 ATM (0.50) TDP1ALDH1A1HSD17B10MMP9MMP12
SCHEMBL29060214 0.68 ATM (0.49) TDP1ALDH1A1NPSR1HSD17B10HPGD
SCHEMBL28172824 0.68 ATM (0.52) TDP1ALDH1A1HSD17B10MMP9MMP12
SCHEMBL22097454 0.67 SCN9A (0.40) TDP1ALDH1A1NPSR1MMP9MMP12
SCHEMBL10451485 0.67 ALDH1A1 (0.48) TDP1ALDH1A1TSHRNPSR1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161255-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-20230161255-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
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