SCHEMBL25527351

SCHEMBL25527351

O=C(CS)Oc1c(F)cc(C(=O)O)cc1F

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.39
MAPK1 P28482 2/20 0.39
HTT P42858 1/20 0.39
RAB9A P51151 1/20 0.39
PLAU P00749 1/20 0.37
CA12 O43570 3/20 0.36
CA1 P00915 3/20 0.36
CA2 P00918 3/20 0.36
CA7 P43166 3/20 0.36
CA9 Q16790 3/20 0.36
CA14 Q9ULX7 3/20 0.36
KDM4E B2RXH2 2/20 0.36
HSD17B10 Q99714 2/20 0.36
CA3 P07451 2/20 0.36
CA4 P22748 2/20 0.36
CA6 P23280 2/20 0.36
CA5A P35218 2/20 0.36
CA5B Q9Y2D0 2/20 0.36
ALDH1A1 P00352 1/20 0.36
TP53 P04637 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25527372 0.79 TPMT (0.49) LMNAMAPK1PLAUCA12CA1
SCHEMBL25527349 0.79 TPMT (0.41) RAB9ACA12CA1CA2CA7
SCHEMBL25527350 0.78 RAB9A (0.58) LMNAMAPK1HTTRAB9ACA12
SCHEMBL25527361 0.75 KEAP1 (0.38) KDM4EMAPTCES2CES1
SCHEMBL9623929 0.73 PLAU (0.53) LMNAMAPK1HTTRAB9APLAU
SCHEMBL25527367 0.71 ALB (0.47) MAPK1KDM4EHSD17B10ALDH1A1MAPT
SCHEMBL1458628 0.71 LMNA (0.58) LMNAMAPK1HTTRAB9ACA12
SCHEMBL1012426 0.70 PDE5A (0.46) LMNAMAPK1HTTRAB9APLAU
SCHEMBL1408238 0.70 TSHR (0.44) CA1CA2CA9HSD17B10MAPT
SCHEMBL25527356 0.69 POLB (0.32) HSD17B10MAPTSMN1; SMN2TDP1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152696-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed
US-20230152696-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed