Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4F2 | P78329 | 1/20 | 0.37 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.37 |
| ▸ | RIPK1 | Q13546 | 10/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.33 |
| ▸ | CES2 | O00748 | 1/20 | 0.33 |
| ▸ | CES1 | P23141 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.32 |
| ▸ | DDR1 | Q08345 | 1/20 | 0.31 |
| ▸ | CTSD | P07339 | 1/20 | 0.31 |
| ▸ | BACE1 | P56817 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25563997 | 0.83 | KCNN4 (0.46) | RIPK1CES2CES1 | |
| SCHEMBL25563998 | 0.82 | KDM4E (0.41) | RIPK1KDM4E | |
| SCHEMBL25564035 | 0.82 | CES2 (0.42) | GAACES2KDM4EDDR1 | |
| SCHEMBL25564011 | 0.82 | CYP4F2 (0.37) | CYP4F2CYP4A11RIPK1GAASLC6A3 | |
| SCHEMBL25563988 | 0.79 | CES2 (0.37) | CYP4F2CYP4A11RIPK1GAASLC6A3 | |
| SCHEMBL25564007 | 0.78 | RIPK1 (0.41) | CYP4F2CYP4A11RIPK1SLC6A3CES2 | |
| Ammonia Solution, Strong SCHEMBL11492425 | 0.77 | KDM4E (0.38) | RIPK1KDM4E | |
| SCHEMBL25564060 | 0.77 | EPHX2 (0.35) | DDR1 | |
| SCHEMBL5571854 | 0.76 | CYP2C19 (0.48) | RIPK1 | |
| SCHEMBL18408916 | 0.76 | CYP2C19 (0.48) | RIPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230367213-A1 | MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230194986-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-22 | — | — | US | disclosed |
| US-20230161254-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |