SCHEMBL25564007

SCHEMBL25564007

CCC(C)(OC(C)=O)c1ccc(F)c(F)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RIPK1 Q13546 3/20 0.41
KCNN4 O15554 1/20 0.40
HDAC3 O15379 1/20 0.37
HDAC1 Q13547 1/20 0.37
HDAC2 Q92769 1/20 0.37
HDAC6 Q9UBN7 1/20 0.37
HPGD P15428 1/20 0.37
TSHR P16473 1/20 0.37
CYP4F2 P78329 1/20 0.36
CYP4A11 Q02928 1/20 0.36
MAOA P21397 1/20 0.36
MAOB P27338 1/20 0.36
AKR1C3 P42330 1/20 0.35
AKR1C2 P52895 1/20 0.35
CES2 O00748 1/20 0.35
CES1 P23141 1/20 0.35
CHRNA1 P02708 1/20 0.35
CHRNG P07510 1/20 0.35
CHRNB1 P11230 1/20 0.35
CHRNB2 P17787 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25564013 0.84 KCNN4 (0.40) RIPK1KCNN4HDAC3HDAC1HDAC2
SCHEMBL25563992 0.81 KCNN4 (0.42) RIPK1KCNN4HDAC3HDAC1HDAC2
SCHEMBL25563998 0.81 KDM4E (0.41) RIPK1KCNN4HDAC3HDAC1HDAC2
SCHEMBL25563997 0.79 KCNN4 (0.46) RIPK1KCNN4HDAC3HDAC1HDAC2
SCHEMBL25564036 0.78 AR (0.40) HPGDCES2
SCHEMBL25564005 0.78 CYP4F2 (0.37) RIPK1CYP4F2CYP4A11CES2CES1
SCHEMBL25564028 0.78 CES2 (0.42) HPGDMAOBCES2CES1
Ammonia Solution, Strong SCHEMBL11492425 0.76 KDM4E (0.38) RIPK1KCNN4
SCHEMBL25564038 0.76 CES2 (0.45) HDAC3HDAC1HDAC2HPGDMAOB
SCHEMBL5571854 0.76 CYP2C19 (0.48) RIPK1KCNN4HDAC3HDAC1HDAC2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230367213-A1 MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-16 US disclosed
US-20230194986-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-22 US disclosed
US-20230161254-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed