Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNN4 | O15554 | 1/20 | 0.40 |
| ▸ | RIPK1 | Q13546 | 2/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.36 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.36 |
| ▸ | MAOA | P21397 | 1/20 | 0.36 |
| ▸ | MAOB | P27338 | 1/20 | 0.36 |
| ▸ | TRPA1 | O75762 | 2/20 | 0.36 |
| ▸ | CES2 | O00748 | 1/20 | 0.35 |
| ▸ | CES1 | P23141 | 1/20 | 0.35 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.35 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.35 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.35 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.35 |
| ▸ | PDE2A | O00408 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25564007 | 0.84 | RIPK1 (0.41) | KCNN4RIPK1HPGDTSHRCYP4F2 | |
| SCHEMBL25564002 | 0.81 | KCNN4 (0.40) | KCNN4RIPK1HPGDMAOBHDAC3 | |
| SCHEMBL25564019 | 0.79 | KCNN4 (0.46) | KCNN4RIPK1MAOBCES2CES1 | |
| SCHEMBL25564047 | 0.78 | AR (0.40) | HPGDMAOBCES2 | |
| SCHEMBL25564011 | 0.78 | CYP4F2 (0.37) | RIPK1CYP4F2CYP4A11CES2CES1 | |
| SCHEMBL25564041 | 0.78 | CES2 (0.42) | HPGDMAOBCES2CES1 | |
| SCHEMBL25563992 | 0.78 | KCNN4 (0.42) | KCNN4RIPK1HPGDCYP4F2CYP4A11 | |
| SCHEMBL25564040 | 0.76 | ALDH1A1 (0.48) | MAOBCES2RAB9A | |
| SCHEMBL15737637 | 0.76 | KCNN4 (0.33) | KCNN4RIPK1HPGDTSHRTRPA1 | |
| SCHEMBL25564069 | 0.76 | CYP2C19 (0.38) | HPGDHDAC3HDAC1HDAC2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230367213-A1 | MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230194986-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-22 | — | — | US | disclosed |
| US-20230161254-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |