SCHEMBL25564255

SCHEMBL25564255

CC(=O)OC1(c2cc(C(F)(F)F)cc(C(F)(F)F)c2)CCCCC1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CCR2 P41597 2/20 0.37
CES2 O00748 1/20 0.37
USP2 O75604 3/20 0.36
TACR1 P25103 2/20 0.36
CYP2C19 P33261 2/20 0.36
CYP1A2 P05177 1/20 0.36
SLC6A4 P31645 3/20 0.36
SLC6A3 Q01959 2/20 0.36
HIF1A Q16665 1/20 0.36
SLC6A2 P23975 1/20 0.36
HPGD P15428 1/20 0.36
CYP3A4 P08684 4/20 0.36
TSHR P16473 3/20 0.36
CYP2D6 P10635 2/20 0.36
HDAC3 O15379 1/20 0.35
HDAC1 Q13547 1/20 0.35
HDAC2 Q92769 1/20 0.35
HDAC6 Q9UBN7 1/20 0.35
AKR1C3 P42330 1/20 0.35
AKR1C2 P52895 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25564150 0.98 CCR2 (0.38) CCR2CES2USP2TACR1CYP2C19
SCHEMBL25564243 0.86 SLC6A4 (0.50) CCR2SLC6A4SLC6A3SLC6A2HPGD
SCHEMBL25564245 0.85 SLC6A3 (0.46) CES2SLC6A4SLC6A3SLC6A2HPGD
SCHEMBL25564143 0.84 CCR2 (0.49) CCR2CES2SLC6A4SLC6A3SLC6A2
SCHEMBL25564144 0.83 SLC6A3 (0.43) CES2USP2CYP2C19SLC6A4SLC6A3
SCHEMBL25564314 0.80 HDAC3 (0.37) CES2SLC6A4SLC6A3SLC6A2HDAC3
SCHEMBL25564311 0.80 HDAC3 (0.37) CES2SLC6A4SLC6A3SLC6A2HDAC3
SCHEMBL25564232 0.80 HDAC3 (0.37) CES2SLC6A4SLC6A3SLC6A2HDAC3
SCHEMBL25564261 0.79 SLC6A4 (0.39) CYP2C19SLC6A4SLC6A3SLC6A2CYP3A4
SCHEMBL25564135 0.78 DRD2 (0.37) CES2SLC6A4SLC6A3SLC6A2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230367213-A1 MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-16 US disclosed
US-20230194986-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-22 US disclosed
US-20230161254-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed