Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A4 | P31645 | 7/20 | 0.36 |
| ▸ | SLC6A3 | Q01959 | 6/20 | 0.36 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.36 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.34 |
| ▸ | DRD2 | P14416 | 1/20 | 0.34 |
| ▸ | DRD4 | P21917 | 1/20 | 0.34 |
| ▸ | DRD3 | P35462 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | PPARA | Q07869 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25632868 | 0.99 | SLC6A4 (0.35) | SLC6A4SLC6A3SLC6A2ADORA3DRD2 | |
| SCHEMBL25564289 | 0.88 | SLC6A4 (0.39) | SLC6A4SLC6A3SLC6A2ADORA3DRD2 | |
| SCHEMBL25564216 | 0.87 | LIPE (0.37) | SLC6A4SLC6A3SLC6A2ADORA3DRD2 | |
| SCHEMBL25631063 | 0.85 | SLC6A4 (0.50) | SLC6A4DRD2DRD4DRD3MEN1 | |
| SCHEMBL25564215 | 0.83 | SLC6A4 (0.48) | SLC6A4DRD2DRD4DRD3MEN1 | |
| SCHEMBL25564249 | 0.82 | SLC6A4 (0.51) | SLC6A4SLC6A3SLC6A2ADORA3POLB | |
| SCHEMBL25564148 | 0.81 | SLC6A4 (0.49) | SLC6A4SLC6A3SLC6A2ADORA3 | |
| SCHEMBL25564288 | 0.80 | ADORA3 (0.40) | SLC6A4SLC6A3SLC6A2ADORA3DRD2 | |
| SCHEMBL25564245 | 0.79 | SLC6A3 (0.46) | SLC6A4SLC6A3SLC6A2DRD2DRD4 | |
| SCHEMBL25564144 | 0.77 | SLC6A3 (0.43) | SLC6A4SLC6A3SLC6A2DRD2DRD4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230367213-A1 | MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230194986-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-22 | — | — | US | disclosed |
| US-20230161254-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |