Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 4/20 | 0.39 |
| ▸ | RIPK1 | Q13546 | 7/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | TRPM8 | Q7Z2W7 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | XBP1 | P17861 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25597071 | 0.90 | ELANE (0.39) | ELANERIPK1POLBMAPTGAA | |
| SCHEMBL25596261 | 0.87 | ELANE (0.39) | ELANEPOLBMAPTGAAXBP1 | |
| SCHEMBL17307150 | 0.86 | ELANE (0.42) | ELANERIPK1POLBMAPTGAA | |
| SCHEMBL25596259 | 0.85 | MRGPRX4 (0.38) | ELANEMAPTGAANPSR1HSD11B1 | |
| SCHEMBL17552760 | 0.82 | RIPK1 (0.48) | ELANERIPK1GAAL3MBTL1 | |
| SCHEMBL14701785 | 0.80 | ELANE (0.37) | ELANERIPK1POLBMAPT | |
| SCHEMBL15294396 | 0.79 | ELANE (0.43) | ELANERIPK1POLBMAPTGAA | |
| SCHEMBL10115670 | 0.79 | HSD11B1 (0.48) | ELANEHSD11B1 | |
| SCHEMBL26078922 | 0.79 | KCNJ11 (0.40) | ELANEPOLBMAPTGAAXBP1 | |
| SCHEMBL25596226 | 0.77 | FAAH (0.39) | ELANEATMHSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11681224-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-06-20 | — | — | US | disclosed |