SCHEMBL25698136

SCHEMBL25698136

CCCCC(CC)COC(=O)Nc1ccccc1C(=N)CC

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 5/20 0.58
▸ CYP3A4 P08684 3/20 0.58
▸ CA2 P00918 1/20 0.58
▸ LMNA P02545 3/20 0.54
▸ PRSS1 P07477 1/20 0.53
▸ PRSS2 P07478 1/20 0.53
▸ PRSS3 P35030 1/20 0.53
▸ CYP1A2 P05177 1/20 0.49
▸ CYP2C19 P33261 1/20 0.49
▸ SMN1; SMN2 Q16637 1/20 0.49
▸ TSHR P16473 4/20 0.45
▸ MAPK1 P28482 2/20 0.45
▸ HSD17B10 Q99714 2/20 0.45
▸ TDP1 Q9NUW8 2/20 0.42
▸ ATM Q13315 1/20 0.42
▸ KDM4E B2RXH2 3/20 0.42
▸ KMT2A Q03164 2/20 0.40
▸ MEN1 O00255 1/20 0.40
▸ L3MBTL1 Q9Y468 1/20 0.39
▸ RECQL P46063 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14545166 0.81 ALDH1A1 (0.56) ALDH1A1CYP3A4CA2LMNAPRSS1
SCHEMBL8651105 0.80 ALDH1A1 (0.55) ALDH1A1CYP3A4CA2LMNAPRSS1
SCHEMBL11798186 0.78 ALDH1A1 (0.62) ALDH1A1CYP3A4CA2LMNAPRSS1
SCHEMBL9128495 0.76 LMNA (0.55) ALDH1A1CYP3A4CA2LMNAPRSS1
SCHEMBL31126842 0.76 ALDH1A1 (0.50) ALDH1A1CYP3A4CA2LMNAPRSS1
SCHEMBL8652532 0.75 LMNA (0.54) ALDH1A1CYP3A4CA2LMNAPRSS1
SCHEMBL27501209 0.75 ALDH1A1 (0.78) ALDH1A1CYP3A4CA2LMNAPRSS1
Bis(2-Ethylhexyl) Phthalate SCHEMBL2864306 0.75 ALDH1A1 (1.00) ALDH1A1CYP3A4CA2LMNAPRSS1
Bis(2-Ethylhexyl)Phthalate SCHEMBL21733281 0.75 ALDH1A1 (1.00) ALDH1A1CYP3A4CA2LMNAPRSS1
Bis(2-Ethylhexyl)Phthalate SCHEMBL29411299 0.75 ALDH1A1 (1.00) ALDH1A1CYP3A4CA2LMNAPRSS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4198630-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2023-06-21 — — EP disclosed
Send feedback