SCHEMBL25698251

SCHEMBL25698251

CCCCC(CC)COC(=O)Nc1ccc(OC(C)=O)cc1N

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 5/20 0.44
▸ CYP3A4 P08684 3/20 0.44
▸ CA2 P00918 1/20 0.44
▸ TSHR P16473 3/20 0.42
▸ LMNA P02545 3/20 0.42
▸ MAPK1 P28482 3/20 0.42
▸ HSD17B10 Q99714 1/20 0.42
▸ ERAP2 Q6P179 3/20 0.42
▸ TDP1 Q9NUW8 2/20 0.42
▸ LNPEP Q9UIQ6 2/20 0.42
▸ PRSS1 P07477 1/20 0.40
▸ PRSS2 P07478 1/20 0.40
▸ PRSS3 P35030 1/20 0.40
▸ ATM Q13315 2/20 0.40
▸ GAA P10253 1/20 0.39
▸ XBP1 P17861 1/20 0.39
▸ NPSR1 Q6W5P4 1/20 0.39
▸ L3MBTL1 Q9Y468 1/20 0.39
▸ KCNQ3 O43525 1/20 0.36
▸ KCNQ2 O43526 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11339612 0.73 ALDH1A1 (0.60) ALDH1A1CYP3A4CA2TSHRLMNA
SCHEMBL14545166 0.73 ALDH1A1 (0.56) ALDH1A1CYP3A4CA2TSHRLMNA
SCHEMBL1835542 0.72 LMNA (0.53) ALDH1A1CYP3A4CA2TSHRLMNA
SCHEMBL6498572 0.72 KDM4E (0.52) ALDH1A1CYP3A4LMNAHSD17B10GAA
SCHEMBL14544818 0.71 ALDH1A1 (0.47) ALDH1A1CYP3A4CA2TSHRLMNA
SCHEMBL9128495 0.71 LMNA (0.55) ALDH1A1CYP3A4CA2TSHRLMNA
SCHEMBL31126842 0.71 ALDH1A1 (0.50) ALDH1A1CYP3A4CA2TSHRLMNA
SCHEMBL11798186 0.70 ALDH1A1 (0.62) ALDH1A1CYP3A4CA2TSHRLMNA
SCHEMBL8944905 0.70 CYP3A4 (0.60) ALDH1A1CYP3A4CA2TSHRLMNA
SCHEMBL13431874 0.69 ALDH1A1 (0.53) ALDH1A1CYP3A4CA2TSHRLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4198630-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2023-06-21 — — EP disclosed
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