SCHEMBL25699012

SCHEMBL25699012

C=CC1(OC(=O)C(=C)C)CCSCC1

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24189356 0.92 ALDH1A1 (0.32) ALDH1A1
SCHEMBL87781 0.87 ALDH1A1 (0.39) ALDH1A1
Methacrylic Acid SCHEMBL728730 0.84 ALDH1A1 (0.37) ALDH1A1
SCHEMBL47317 0.84 ALDH1A1 (0.37) ALDH1A1
SCHEMBL47318 0.82 ALDH1A1 (0.35) ALDH1A1
SCHEMBL47316 0.82 ALDH1A1 (0.35) ALDH1A1
SCHEMBL9421672 0.78 ALDH1A1 (0.32) ALDH1A1
SCHEMBL22941769 0.78 SCN1A (0.33) ALDH1A1
SCHEMBL207426 0.77 ALDH1A1 (0.37) ALDH1A1
SCHEMBL24908660 0.74 MAPT (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230185192-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-06-15 US disclosed
US-20230185192-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-06-15 US disclosed