Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13900356 | 0.86 | ALDH1A1 (0.44) | ALDH1A1TSHR | |
| SCHEMBL27945670 | 0.86 | ALDH1A1 (0.44) | ALDH1A1TSHR | |
| SCHEMBL47313 | 0.82 | ALDH1A1 (0.41) | ALDH1A1TSHR | |
| SCHEMBL673273 | 0.82 | ALDH1A1 (0.41) | ALDH1A1TSHR | |
| SCHEMBL685576 | 0.80 | ALDH1A1 (0.39) | ALDH1A1TSHR | |
| SCHEMBL6912158 | 0.80 | ALDH1A1 (0.39) | ALDH1A1TSHR | |
| SCHEMBL1832545 | 0.80 | ALDH1A1 (0.39) | ALDH1A1TSHR | |
| SCHEMBL685580 | 0.80 | ALDH1A1 (0.39) | ALDH1A1TSHR | |
| SCHEMBL28137014 | 0.80 | ALDH1A1 (0.39) | ALDH1A1TSHR | |
| SCHEMBL74808 | 0.80 | ALDH1A1 (0.39) | ALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8846293-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition | FUJIFILM CORPORATION (JP) | 2014-09-30 | — | — | US | disclosed |
| US-8846293-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition | FUJIFILM CORPORATION (JP) | 2014-09-30 | — | — | US | disclosed |
| US-20120251948-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-10-04 | — | — | US | disclosed |
| US-20120251948-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-10-04 | — | — | US | disclosed |
| US-8088556-B2 | Thiopyran derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist composition | FUJITSU LIMITED (JP) | 2012-01-03 | — | — | US | disclosed |
| US-8088556-B2 | Thiopyran derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist composition | FUJITSU LIMITED (JP) | 2012-01-03 | — | — | US | disclosed |
| US-8088556-B2 | Thiopyran derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist composition | FUJITSU LIMITED (JP) | 2012-01-03 | — | — | US | disclosed |
| US-8080365-B2 | Thiopyran derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist composition | FUJITSU LIMITED (JP) | 2011-12-20 | — | — | US | disclosed |
| US-8080365-B2 | Thiopyran derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist composition | FUJITSU LIMITED (JP) | 2011-12-20 | — | — | US | disclosed |
| US-8080365-B2 | Thiopyran derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist composition | FUJITSU LIMITED (JP) | 2011-12-20 | — | — | US | disclosed |
| US-7897321-B2 | Monomer, resin, resist composition using the resin, and method producing semiconductor device using the resist composition | FUJITSU LIMITED (JP) | 2011-03-01 | — | — | US | disclosed |
| US-20100248154-A1 | THIOPYRAN DERIVATIVE, POLYMER, RESIST COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SUCH RESIST COMPOSITION | FUJITSU LIMITED (JP) | 2010-09-30 | — | — | US | disclosed |
| US-20100248154-A1 | THIOPYRAN DERIVATIVE, POLYMER, RESIST COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SUCH RESIST COMPOSITION | FUJITSU LIMITED (JP) | 2010-09-30 | — | — | US | disclosed |
| US-20100248154-A1 | THIOPYRAN DERIVATIVE, POLYMER, RESIST COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SUCH RESIST COMPOSITION | FUJITSU LIMITED (JP) | 2010-09-30 | — | — | US | disclosed |
| US-20100227275-A1 | THIOPYRAN DERIVATIVE, POLYMER, RESIST COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SUCH RESIST COMPOSITION | FUJITSU LIMITED (JP) | 2010-09-09 | — | — | US | disclosed |
| US-20100227275-A1 | THIOPYRAN DERIVATIVE, POLYMER, RESIST COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SUCH RESIST COMPOSITION | FUJITSU LIMITED (JP) | 2010-09-09 | — | — | US | disclosed |
| US-20100227275-A1 | THIOPYRAN DERIVATIVE, POLYMER, RESIST COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SUCH RESIST COMPOSITION | FUJITSU LIMITED (JP) | 2010-09-09 | — | — | US | disclosed |
| US-20090191485-A1 | MONOMER, RESIN, RESIST COMPOSITION USING THE RESIN, AND METHOD PRODUCING SEMICONDUCTOR DEVICE USING THE RESIST COMPOSITION | FUJITSU LIMITED (JP) | 2009-07-30 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090191485-A1 | MONOMER, RESIN, RESIST COMPOSITION USING THE RESIN, AND METHOD PRODUCING SEMICONDUCTOR DEVICE USING THE RESIST COMPOSITION | AFF1, AFF4, RER1 | ALDH1A1 1915/4885TSHR 1359/4885 |
| US-20100227275-A1 | THIOPYRAN DERIVATIVE, POLYMER, RESIST COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SUCH RESIST COMPOSITION | TST, RPS4Y1, TERT | ALDH1A1 2109/4885TSHR 198/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.