SCHEMBL25736748

SCHEMBL25736748

CC(S)C(=O)Oc1ccc(NC(=O)OC(C)(C)C)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PPARG P37231 1/20 0.47
PPARA Q07869 1/20 0.47
LIPE Q05469 1/20 0.47
GAA P10253 3/20 0.46
ALDH1A1 P00352 3/20 0.46
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
LMNA P02545 1/20 0.46
TP53 P04637 1/20 0.46
CYP17A1 P05093 3/20 0.44
HPGD P15428 2/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
NPC1 O15118 1/20 0.43
CYP1A2 P05177 1/20 0.43
CYP2D6 P10635 1/20 0.43
CYP2C9 P11712 1/20 0.43
CYP2C19 P33261 1/20 0.43
RAB9A P51151 1/20 0.43
PSMB8 P28062 1/20 0.42
NAMPT P43490 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25736749 0.84 FAAH (0.47) GAAALDH1A1MEN1KMT2ACYP17A1
SCHEMBL6665914 0.80 LIPE (0.52) PPARGPPARALIPEGAAALDH1A1
SCHEMBL4636496 0.80 LIPE (0.52) PPARGPPARALIPEGAAALDH1A1
SCHEMBL1162988 0.80 LIPE (0.52) PPARGPPARALIPEGAAALDH1A1
SCHEMBL13055402 0.79 CYP17A1 (0.59) LIPEGAAALDH1A1CYP17A1SMN1; SMN2
SCHEMBL21480310 0.79 ALDH1A1 (0.61) PPARGPPARALIPEGAAALDH1A1
SCHEMBL18353040 0.79 LIPE (0.51) PPARGPPARALIPEGAAALDH1A1
SCHEMBL25736722 0.78 PPARG (0.54) PPARGPPARALIPEGAAALDH1A1
SCHEMBL29131710 0.78 HPGD (0.59) PPARGPPARALIPEGAAALDH1A1
SCHEMBL30374663 0.78 KMT2A (0.56) PPARGPPARALIPEALDH1A1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed