SCHEMBL25736749

SCHEMBL25736749

CC(S)C(=O)Oc1cccc(NC(=O)OC(C)(C)C)c1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FAAH O00519 1/20 0.47
ALDH1A1 P00352 1/20 0.47
CYP3A4 P08684 1/20 0.47
MAPK1 P28482 1/20 0.47
RXFP1 Q9HBX9 1/20 0.44
TDP2 O95551 1/20 0.43
HDAC1 Q13547 2/20 0.43
HDAC3 O15379 1/20 0.43
HDAC2 Q92769 1/20 0.43
HDAC8 Q9BY41 1/20 0.43
HDAC6 Q9UBN7 1/20 0.43
CYP17A1 P05093 1/20 0.42
KMT2A Q03164 2/20 0.42
MEN1 O00255 1/20 0.42
CYP1A2 P05177 1/20 0.42
KAT6A Q92794 1/20 0.42
HPGD P15428 2/20 0.41
THRB P10828 1/20 0.41
KDM4E B2RXH2 1/20 0.41
GLA P06280 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5894005 0.85 CA2 (0.52) FAAHALDH1A1CYP3A4MAPK1RXFP1
SCHEMBL25736748 0.84 PPARG (0.47) ALDH1A1TDP2CYP17A1KMT2AMEN1
SCHEMBL999347 0.82 KMT2A (0.61) FAAHALDH1A1CYP3A4MAPK1RXFP1
SCHEMBL3892771 0.82 ALDH1A1 (0.52) FAAHALDH1A1CYP3A4MAPK1RXFP1
SCHEMBL25736723 0.81 CYP3A4 (0.51) FAAHALDH1A1CYP3A4MAPK1RXFP1
SCHEMBL26785208 0.80 MAPK1 (0.50) FAAHALDH1A1CYP3A4MAPK1RXFP1
SCHEMBL281590 0.79 RAB9A (0.59) ALDH1A1MAPK1RXFP1KMT2AHPGD
SCHEMBL23871058 0.79 MAPK1 (0.49) FAAHALDH1A1CYP3A4MAPK1RXFP1
SCHEMBL28890018 0.79 ACHE (0.49) FAAHALDH1A1CYP3A4MAPK1TDP2
SCHEMBL29029431 0.79 HDAC3 (0.56) MAPK1RXFP1HDAC1HDAC3HDAC2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed