SCHEMBL25779643

SCHEMBL25779643

C=C(C)c1ccc(C(=O)OC(C)OCC)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 3/20 0.42
CA1 P00915 3/20 0.42
CA2 P00918 3/20 0.42
CA7 P43166 3/20 0.42
CA9 Q16790 3/20 0.42
CA14 Q9ULX7 3/20 0.42
CYP4F2 P78329 1/20 0.41
CYP4A11 Q02928 1/20 0.41
L3MBTL1 Q9Y468 2/20 0.40
ALDH1A1 P00352 1/20 0.40
PDCD1 Q15116 1/20 0.39
CD274 Q9NZQ7 1/20 0.39
ESR1 P03372 1/20 0.39
ESR2 Q92731 1/20 0.39
HPGD P15428 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
GAA P10253 1/20 0.38
LMNA P02545 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP3A4 P08684 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8375375 0.90 CA1 (0.50) CA12CA1CA2CA7CA9
SCHEMBL24600114 0.87 L3MBTL1 (0.49) CA12CA1CA2CA7CA9
SCHEMBL25780276 0.86 CA12 (0.41) CA12CA1CA2CA7CA9
SCHEMBL27910803 0.85 MAPT (0.39) CA12CA1CA2CA7CA9
SCHEMBL17824366 0.83 MAPT (0.53) CA12CA1CA2CA7CA9
SCHEMBL10880499 0.82 LMNA (0.59) CA12CA1CA2CA7CA9
SCHEMBL17797883 0.81 CA12 (0.46) CA12CA1CA2CA7CA9
SCHEMBL9166635 0.81 TSHR (0.52) ALDH1A1PDCD1CD274LMNACYP1A2
SCHEMBL4210777 0.81 TAS1R3 (0.44) CA12CA1CA2CA7CA9
SCHEMBL17233761 0.81 CA1 (0.53) CA1CA2L3MBTL1ALDH1A1NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230213862-A1 PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-07-06 US disclosed
CN-101876789-B Positive photo-sensitive resin composition and solidification film forming method using same FUJIFILM 2013-10-30 CN disclosed
CN-101876791-B Positive photo-resist resin composition and solidification film forming method using the composition FUJIFILM 2013-06-12 CN disclosed