SCHEMBL2581085

SCHEMBL2581085

CCCCOCCC[Si](OCC)(OCC)OCC

nearest known ligand 0.44

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.44
CYP3A4 P08684 2/20 0.39
MEN1 O00255 1/20 0.35
THRB P10828 1/20 0.35
HTT P42858 1/20 0.35
KMT2A Q03164 1/20 0.35
MAPT P10636 1/20 0.35
SMN1; SMN2 Q16637 2/20 0.33
HPGD P15428 1/20 0.33
ADRB2 P07550 1/20 0.33
ADRB1 P08588 1/20 0.33
ADRB3 P13945 1/20 0.33
LMNA P02545 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11020286 0.98 TSHR (0.43) TSHRCYP3A4MEN1THRBHTT
SCHEMBL3503366 0.93 TSHR (0.33) TSHRMEN1THRBHTTKMT2A
SCHEMBL3893505 0.91 TSHR (0.34) TSHRCYP3A4MEN1THRBHTT
SCHEMBL21440327 0.91 TSHR (0.44) TSHRCYP3A4MEN1THRBHTT
SCHEMBL15705449 0.91 MEN1 (0.33) TSHRCYP3A4MEN1THRBHTT
SCHEMBL17991841 0.91 TSHR (0.32) TSHR
SCHEMBL16367157 0.90 HTT (0.50) TSHRCYP3A4MEN1THRBHTT
SCHEMBL11021775 0.86 ALDH1A1 (0.33) TSHRCYP3A4MEN1THRBHTT
SCHEMBL3214360 0.86 ALDH1A1 (0.33) TSHRCYP3A4MEN1THRBHTT
SCHEMBL3889706 0.86 ALDH1A1 (0.36) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115427229-A Laminate comprising transparent highly heat-resistant film 东洋纺株式会社 2022-12-02 CN disclosed
CN-115003749-A Dispersion liquid AGC株式会社 2022-09-02 CN disclosed
CN-110320755-A Minus white photosensitive resin composition and its application 奇美实业股份有限公司 2019-10-11 CN disclosed
CN-105093832-B Photosensitive composition, protective film and element having protective film 奇美实业股份有限公司 2019-08-30 CN disclosed
CN-104345567-B photosensitive polysiloxane composition and application thereof 奇美实业股份有限公司 2019-04-02 CN disclosed
CN-109116681-A Chemically amplified positive photosensitive resin composition, photoresist pattern and method for forming the same, and electronic device 奇美实业股份有限公司 2019-01-01 CN disclosed
CN-109062007-A positive photosensitive polysiloxane composition and application thereof 奇美实业股份有限公司 2018-12-21 CN disclosed
CN-104423168-B Positive photosensitive resin composition and pattern forming method thereof 奇美实业股份有限公司 2018-11-30 CN disclosed
CN-108693710-A Positive photosensitive polysiloxane composition 奇美实业股份有限公司 2018-10-23 CN disclosed
CN-107885034-A Negative white photosensitive resin composition and application thereof 奇美实业股份有限公司 2018-04-06 CN disclosed
CN-103293852-B Photosensitive resin composition, black matrix, color filter and liquid crystal display element thereof CHI MEI CORP 2015-07-15 CN disclosed
CN-103135344-B Photosensitive resin composition, black matrix, color filter and liquid crystal display element thereof CHI MEI CORP 2015-07-08 CN disclosed
CN-104678705-A Red photosensitive resin composition for color filter and application thereof CHI MEI CORP 2015-06-03 CN disclosed
CN-104570598-A Photosensitive resin composition, color filter and liquid crystal display element thereof CHI MEI CORP 2015-04-29 CN disclosed
CN-104423168-A Positive photosensitive resin composition and pattern forming method thereof CHI MEI CORP 2015-03-18 CN disclosed
CN-104375381-A Photosensitive polysiloxane composition, film formed by photosensitive polysiloxane composition and device comprising film CHI MEI CORP 2015-02-25 CN disclosed
CN-104345567-A Photosensitive polysiloxane composition and application thereof CHI MEI CORP 2015-02-11 CN disclosed
CN-104345554-A Photosensitive resin composition, color filter and liquid crystal display element thereof CHI MEI CORP 2015-02-11 CN disclosed
US-8049024-B2 Heterogenized rhodium complexes, methods of their synthesis and application as hydrosilylation catalysts ADAM MICKIEWICZ UNIVERSITY (PL) 2011-11-01 US disclosed
US-20100048932-A1 New Heterogenized Rhodium Complexes, Methods of their Synthesis and Application as Hydrosilylation Catalysts ADAM MICKIEWICZ UNIVERSITY (PL) 2010-02-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100048932-A1 New Heterogenized Rhodium Complexes, Methods of their Synthesis and Application as Hydrosilylation Catalysts SQLE, HAO2, IPO11 TSHR 3500/4885CYP3A4 1817/4885MEN1 2115/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.