Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 4/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | CES2 | O00748 | 1/20 | 0.34 |
| ▸ | CES1 | P23141 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 2/20 | 0.33 |
| ▸ | ESR1 | P03372 | 1/20 | 0.32 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.32 |
| ▸ | GLA | P06280 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | APEX1 | P27695 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | GPX4 | P36969 | 1/20 | 0.31 |
| ▸ | CASP3 | P42574 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9411498 | 0.91 | ELANE (0.45) | ELANEALDH1A1TSHRMAPTHPGD | |
| SCHEMBL19858489 | 0.84 | TSHR (0.41) | ELANEALDH1A1TSHRMAPTHPGD | |
| SCHEMBL2579122 | 0.81 | ELANE (0.42) | ELANEALDH1A1TSHRMAPTHPGD | |
| SCHEMBL8356581 | 0.80 | ELANE (0.45) | ELANEALDH1A1TSHRMAPTHPGD | |
| SCHEMBL1719096 | 0.80 | ELANE (0.45) | ELANEALDH1A1TSHRMAPTHPGD | |
| SCHEMBL1943281 | 0.78 | ELANE (0.46) | ELANEALDH1A1TSHRMAPTHPGD | |
| SCHEMBL2184872 | 0.78 | ELANE (0.46) | ELANEALDH1A1TSHRMAPTHPGD | |
| SCHEMBL28890772 | 0.78 | ELANE (0.46) | ELANEALDH1A1TSHRMAPTHPGD | |
| SCHEMBL2577811 | 0.78 | THRB (0.38) | ALDH1A1TSHRMAPTHPGDKDM4E | |
| SCHEMBL2184635 | 0.76 | ELANE (0.41) | ELANEALDH1A1TSHRMAPTHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9946158-B2 | Composition for forming resist underlayer film for nanoimprint | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-04-17 | — | — | US | disclosed |
| EP-2461350-B1 | USE OF A COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT LITHOGRAPHY | NISSAN CHEMICAL IND LTD (JP) | 2018-02-28 | — | — | EP | disclosed |
| US-20150099070-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT | NISSAN CHEMICAL IND LTD (JP) | 2015-04-09 | — | — | US | disclosed |
| CN-101322074-B | Silicon-containing resist underlying layer film forming composition for formation of photocrosslinking cured resist underlying layer film | NISSAN CHEMICAL IND LTD | 2013-01-23 | — | — | CN | disclosed |
| EP-2461350-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2012-06-06 | — | — | EP | disclosed |
| US-20120128891-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-05-24 | — | — | US | disclosed |
| US-8048615-B2 | Silicon-containing resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-11-01 | — | — | US | disclosed |
| US-20090162782-A1 | Silicon-Containing Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-06-25 | — | — | US | disclosed |
| CN-101322074-A | Silicon-containing resist underlying layer film forming composition for formation of photocrosslinking cured resist underlying layer film | NISSAN CHEMICAL IND LTD (JP) | 2008-12-10 | — | — | CN | disclosed |
| EP-1972998-A1 | SILICON-CONTAINING RESIST UNDERLYING LAYER FILM FORMING COMPOSITION FOR FORMATION OF PHOTOCROSSLINKING CURED RESIST UNDERLYING LAYER FILM | Nissan Chemical Industries, Ltd. (JP) | 2008-09-24 | — | — | EP | disclosed |