SCHEMBL258471

SCHEMBL258471

CCC(CC)(c1ccc(C(=O)O)cc1)P(=O)(O)O

nearest known ligand 0.53

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.53
CYP1A2 P05177 1/20 0.53
KMT2A Q03164 1/20 0.53
SRD5A2 P31213 4/20 0.46
ALDH1A1 P00352 2/20 0.46
NR1H4 Q96RI1 3/20 0.44
PTPN1 P18031 2/20 0.44
EPHX2 P34913 2/20 0.44
TP53 P04637 1/20 0.43
TSHR P16473 1/20 0.43
RARB P10826 1/20 0.42
RARG P13631 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.41
RXRA P19793 2/20 0.40
RXRB P28702 2/20 0.40
NR4A2 P43354 1/20 0.40
HDAC1 Q13547 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL258558 0.98 MEN1 (0.51) MEN1CYP1A2KMT2ASRD5A2ALDH1A1
SCHEMBL7870277 0.87 PGK1 (0.44) MEN1KMT2AALDH1A1PTPN1TSHR
SCHEMBL6421413 0.86 MEN1 (0.38) MEN1CYP1A2KMT2AALDH1A1PTPN1
SCHEMBL9440261 0.85 ALDH1A1 (0.50) MEN1KMT2ASRD5A2ALDH1A1SMN1; SMN2
SCHEMBL258557 0.84 MEN1 (0.37) MEN1CYP1A2KMT2AALDH1A1PTPN1
SCHEMBL6421418 0.84 EPHX2 (0.45) MEN1CYP1A2KMT2AALDH1A1NR1H4
SCHEMBL272507 0.81 MAPT (0.54) MEN1KMT2AALDH1A1PTPN1TSHR
SCHEMBL5859053 0.81 PTPN5 (0.46) PTPN1
Hydrogen Peroxide SCHEMBL8609891 0.81 PTPN1 (0.52) MEN1KMT2AALDH1A1PTPN1TSHR
SCHEMBL1556937 0.81 PTPN1 (0.52) MEN1KMT2AALDH1A1PTPN1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8946068-B2 Patterned doping of semiconductor substrates using photosensitive monolayers INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-02-03 US disclosed
US-20130330918-A1 PATTERNED DOPING OF SEMICONDUCTOR SUBSTRATES USING PHOTOSENSITIVE MONOLAYERS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-12-12 US disclosed
US-8513642-B2 Patterned doping of semiconductor substrates using photosensitive monolayers INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-08-20 US disclosed
US-8354333-B2 Patterned doping of semiconductor substrates using photosensitive monolayers INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-01-15 US disclosed
US-20120273925-A1 PATTERNED DOPING OF SEMICONDUCTOR SUBSTRATES USING PHOTOSENSITIVE MONOLAYERS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-11-01 US disclosed
US-8227171-B2 Photosensitive self-assembled monolayer for selective placement of hydrophilic structures INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-07-24 US disclosed
US-8057984-B2 Photosensitive self-assembled monolayer for selective placement of hydrophilic structures INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-11-15 US disclosed
US-20110186969-A1 PATTERNED DOPING OF SEMICONDUCTOR SUBSTRATES USING PHOTOSENSITIVE MONOLAYERS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-08-04 US disclosed
US-20110165428-A1 PHOTOSENSITIVE SELF-ASSEMBLED MONOLAYER FOR SELECTIVE PLACEMENT OF HYDROPHILIC STRUCTURES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-07-07 US disclosed
US-7888528-B2 Photosensitive self-assembled monolayer for selective placement of hydrophilic structures INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-02-15 US disclosed
US-20100143847-A1 PHOTOSENSITIVE SELF-ASSEMBLED MONOLAYER FOR SELECTIVE PLACEMENT OF HYDROPHILIC STRUCTURES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2010-06-10 US disclosed
US-7732119-B2 Photosensitive self-assembled monolayer for selective placement of hydrophilic structures INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2010-06-08 US disclosed
US-20100003616-A1 PHOTOSENSITIVE SELF-ASSEMBLED MONOLAYER FOR SELECTIVE PLACEMENT OF HYDROPHILIC STRUCTURES GLOBALFOUNDRIES U.S. INC. 2010-01-07 US disclosed
US-20090098347-A1 PHOTOSENSITIVE SELF-ASSEMBLED MONOLAYER FOR SELECTIVE PLACEMENT OF HYDROPHILIC STRUCTURES GLOBALFOUNDRIES U.S. INC. 2009-04-16 US disclosed
WO-2005118584-A2 SAFRAMYCIN ANALOGS AS THERAPEUTIC AGENTS IN THE TREATMENT OF CANCER AXYS PHARMACEUTICALS, INC. (US) 2005-12-15 WO disclosed
EP-0879814-B1 Triaromatic compounds, compositions containing them and uses thereof CT INTERNAT DE BR RECH S DERMA (FR) 2001-11-28 EP disclosed
EP-0879814-A1 Triaromatic compounds, compositions containing them and uses thereof CENTRE INTERNATIONAL DE RECHERCHES DERMATOLOGIQUES GALDERMA (C.I.R.D. GALDERMA) (FR) 1998-11-25 EP disclosed
EP-0313002-B1 Phenyl glycines for use in reducing neurotoxic injury SEARLE & CO (US) 1993-12-01 EP disclosed
US-4918064-A TREATMENT OF ANOXIA OR ISCHEMIA G. D. SEARLE & CO. (US) 1990-04-17 US disclosed
EP-0313002-A2 Phenyl glycines for use in reducing neurotoxic injury G.D. Searle & Co. (US) 1989-04-26 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100003616-A1 PHOTOSENSITIVE SELF-ASSEMBLED MONOLAYER FOR SELECTIVE PLACEMENT OF HYDROPHILIC STRUCTURES EPCAM, SUN2, CDH1 MEN1 2423/4885CYP1A2 1696/4885KMT2A 2369/4885
US-20090098347-A1 PHOTOSENSITIVE SELF-ASSEMBLED MONOLAYER FOR SELECTIVE PLACEMENT OF HYDROPHILIC STRUCTURES EPCAM, SUN2, CDH1 MEN1 2423/4885CYP1A2 1696/4885KMT2A 2369/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.