SCHEMBL25916012

SCHEMBL25916012

CCC(C)(C)c1ccc(S(=O)(=O)OC2(c3ccccc3)CCCC2)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 3/20 0.45
RORC P51449 8/20 0.36
NPC1 O15118 2/20 0.36
RAB9A P51151 2/20 0.36
LMNA P02545 1/20 0.36
MAPK1 P28482 1/20 0.36
CASP3 P42574 1/20 0.36
ATM Q13315 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
SENP8 Q96LD8 1/20 0.36
SENP7 Q9BQF6 1/20 0.36
SENP6 Q9GZR1 1/20 0.36
DRD3 P35462 2/20 0.36
DRD2 P14416 1/20 0.35
KCNH2 Q12809 1/20 0.35
PSEN1 P49768 1/20 0.34
PSEN2 P49810 1/20 0.34
APH1B Q8WW43 1/20 0.34
NCSTN Q92542 1/20 0.34
APH1A Q96BI3 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25834166 0.75 CYP2C9 (0.42) NPC1RAB9ALMNASMN1; SMN2DRD3
SCHEMBL25834165 0.74 CYP2C9 (0.41) NPC1RAB9ALMNASMN1; SMN2DRD3
SCHEMBL25916447 0.74 TDP1 (0.39) HSD11B1DRD3PSEN1PSEN2APH1B
SCHEMBL8838566 0.73 DRD3 (0.44) HSD11B1SMN1; SMN2DRD3POLBCYP2C9
SCHEMBL28032110 0.72 DRD3 (0.43) HSD11B1DRD3PSEN1PSEN2APH1B
SCHEMBL28611137 0.70 DRD3 (0.41) HSD11B1SMN1; SMN2DRD3POLBCYP2C9
SCHEMBL10180029 0.70 HSD11B1 (0.56) HSD11B1NPC1RAB9ALMNAMAPK1
SCHEMBL10180331 0.70 TDP1 (0.54) HSD11B1NPC1RAB9ALMNAMAPK1
SCHEMBL778919 0.70 GAA (0.42) HSD11B1DRD3PSEN1PSEN2APH1B
SCHEMBL14616696 0.69 NPC1 (0.46) HSD11B1NPC1RAB9ALMNAMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230221640-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-07-13 US disclosed
US-20230221640-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-07-13 US disclosed