Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.38 |
| ▸ | PSEN1 | P49768 | 1/20 | 0.37 |
| ▸ | PSEN2 | P49810 | 1/20 | 0.37 |
| ▸ | APH1B | Q8WW43 | 1/20 | 0.37 |
| ▸ | NCSTN | Q92542 | 1/20 | 0.37 |
| ▸ | APH1A | Q96BI3 | 1/20 | 0.37 |
| ▸ | PSENEN | Q9NZ42 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 2/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.35 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.32 |
| ▸ | DRD3 | P35462 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5084591 | 0.75 | TDP1 (0.46) | TDP1ALDH1A1 | |
| SCHEMBL25916012 | 0.74 | HSD11B1 (0.45) | HSD11B1PSEN1PSEN2APH1BNCSTN | |
| SCHEMBL778919 | 0.73 | GAA (0.42) | HSD11B1PSEN1PSEN2APH1BNCSTN | |
| SCHEMBL24715987 | 0.72 | TAS1R3 (0.38) | ALDH1A1TSHRAKR1C1DRD3 | |
| SCHEMBL776247 | 0.72 | PSEN1 (0.42) | PSEN1PSEN2APH1BNCSTNAPH1A | |
| SCHEMBL24262285 | 0.71 | TAS1R3 (0.38) | ALDH1A1TSHRAKR1C1 | |
| SCHEMBL778920 | 0.71 | AKR1C1 (0.44) | HSD11B1PSEN1PSEN2APH1BNCSTN | |
| SCHEMBL14131947 | 0.70 | TDP1 (0.37) | TDP1ALDH1A1TSHR | |
| SCHEMBL7751891 | 0.69 | OPRM1 (0.41) | GAAALDH1A1 | |
| SCHEMBL776248 | 0.69 | AKR1C1 (0.43) | PSEN1PSEN2APH1BNCSTNAPH1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230221640-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-07-13 | — | — | US | disclosed |
| US-20230221640-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-07-13 | — | — | US | disclosed |