SCHEMBL25916200

SCHEMBL25916200

Oc1cc2ccccc2cc1C(c1ccccc1)c1cc2ccccc2cc1O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TYR P14679 1/20 0.43
TRPM4 Q8TD43 1/20 0.39
PTPRC P08575 1/20 0.39
PTPRF P10586 1/20 0.39
PTPN2 P17706 1/20 0.39
PTPRB P23467 1/20 0.39
PTPRE P23469 1/20 0.39
PTPN6 P29350 1/20 0.39
CYP1A2 P05177 1/20 0.37
SLC6A2 P23975 2/20 0.35
SLC6A4 P31645 2/20 0.35
SLC6A3 Q01959 2/20 0.35
UGT2B7 P16662 1/20 0.35
ALOX5 P09917 1/20 0.35
MEN1 O00255 1/20 0.35
MITF O75030 1/20 0.35
GAA P10253 1/20 0.35
MAPT P10636 1/20 0.35
KMT2A Q03164 1/20 0.35
NCOA1 Q15788 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10296826 0.89 TRPM4 (0.40) TYRTRPM4PTPRCPTPRFPTPN2
SCHEMBL30358488 0.89 ESR2 (0.43) ALOX5MEN1GAAMAPTKMT2A
SCHEMBL11038220 0.80 TYR (0.62) TYRTRPM4PTPRCPTPRFPTPN2
SCHEMBL4066948 0.76 ESR2 (0.41) TYRTDP1
SCHEMBL84243 0.75 TYR (0.67) TYRALOX5GAAKMT2ATDP1
SCHEMBL51791 0.75 TYR (0.52) TYRCYP1A2ALOX5GAAKMT2A
SCHEMBL6400171 0.74 GABRA1 (0.54) TYRTRPM4CYP1A2SLC6A2UGT2B7
SCHEMBL51106 0.73 GABRA1 (0.52) TYRSLC6A2SLC6A4SLC6A3MEN1
SCHEMBL27565109 0.72 TRPM4 (0.40) TYRTRPM4PTPRCPTPRFPTPN2
SCHEMBL51095 0.72 CHRM1 (0.55) TYRSLC6A2SLC6A4MEN1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230221640-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-07-13 US disclosed
US-20230221640-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-07-13 US disclosed