Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 1/20 | 0.52 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.52 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | HPGD | P15428 | 4/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.43 |
| ▸ | POLB | P06746 | 2/20 | 0.43 |
| ▸ | LMNA | P02545 | 2/20 | 0.43 |
| ▸ | MAPT | P10636 | 2/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | NPC1 | O15118 | 1/20 | 0.43 |
| ▸ | CA12 | O43570 | 1/20 | 0.43 |
| ▸ | GMNN | O75496 | 1/20 | 0.43 |
| ▸ | EGFR | P00533 | 1/20 | 0.43 |
| ▸ | CA2 | P00918 | 1/20 | 0.43 |
| ▸ | FYN | P06241 | 1/20 | 0.43 |
| ▸ | CA3 | P07451 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | MMP9 | P14780 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL982045 | 0.95 | GABRA1 (0.52) | GABRA1GABRB2TSHRHPGDALDH1A1 | |
| SCHEMBL1758215 | 0.92 | GABRA1 (0.54) | GABRA1GABRB2TSHRHPGDALDH1A1 | |
| SCHEMBL31375412 | 0.92 | GABRA1 (0.54) | GABRA1GABRB2TSHRHPGDALDH1A1 | |
| SCHEMBL28411007 | 0.89 | GABRA1 (0.43) | GABRA1GABRB2TSHRHPGDALDH1A1 | |
| SCHEMBL6414770 | 0.88 | ALOX15 (0.46) | GABRA1GABRB2TSHRHPGDALDH1A1 | |
| SCHEMBL6657261 | 0.86 | TDP1 (0.53) | GABRA1GABRB2TSHRHPGDALDH1A1 | |
| SCHEMBL4660269 | 0.84 | CA1 (0.53) | GABRA1GABRB2TSHRHPGDALDH1A1 | |
| SCHEMBL19806914 | 0.84 | HPGD (0.46) | GABRA1GABRB2TSHRHPGDALDH1A1 | |
| SCHEMBL29407501 | 0.84 | GABRA1 (0.62) | GABRA1GABRB2TSHRHPGDALDH1A1 | |
| SCHEMBL78917 | 0.84 | GABRA1 (0.62) | GABRA1GABRB2TSHRHPGDALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116515109-B | Polyimide polymer and preparation method and application thereof | 五邑大学 | 2025-02-14 | — | — | CN | disclosed |
| US-11747728-B2 | Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-09-05 | — | — | US | disclosed |
| CN-116515109-A | Polyimide polymer and preparation method and application thereof | 五邑大学 | 2023-08-01 | — | — | CN | disclosed |
| US-20210109448-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD AND METHOD FOR PURIFYING RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-04-15 | — | — | US | disclosed |
| EP-3805191-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND RESIN PURIFICATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-04-14 | — | — | EP | disclosed |
| CN-112218844-A | Compound, resin, composition, resist pattern forming method, circuit pattern forming method, and resin purifying method | 三菱瓦斯化学株式会社 | 2021-01-12 | — | — | CN | disclosed |
| US-20190292362-A1 | Catalytically Active Radical Scavengers Based on Benzylic and Allylic Functionalities | HOLLAND NOVOCHEM TECHNICAL COATINGS B.V. (NL) | 2019-09-26 | — | — | US | disclosed |
| CN-109790323-A | Catalytically active radical scavengers based on benzyl and allyl functional groups | 荷兰诺沃赫姆技术涂料私人有限公司 | 2019-05-21 | — | — | CN | disclosed |
| EP-2181853-B1 | Thermosensitive recording medium | JUJO PAPER CO LTD (JP) | 2015-09-23 | — | — | EP | disclosed |
| EP-2838927-A2 | SULFONIUM COMPOUNDS, THEIR PREPARATION AND USE | BASF SE (DE) | 2015-02-25 | — | — | EP | disclosed |
| EP-1746116-A1 | COPOLYMER, GRAFT COPOLYMER, GRAFT COPOLYMER PARTICLE, FLAME RETARDANT, AND RESIN COMPOSITION | Kaneka Corporation (JP) | 2007-01-24 | — | — | EP | disclosed |
| US-20040241598-A1 | Developer for thermal recording material and thermal recording materials | NIPPON PAPER INDUSTRIES CO., LTD. (JP) | 2004-12-02 | — | — | US | disclosed |
| EP-1437231-A1 | DEVELOPER FOR THERMAL RECORDING MATERIAL AND THERMAL RECORDING MATERIALS | API Corporation (JP) | 2004-07-14 | — | — | EP | disclosed |
| EP-1401851-A1 | TWO-STAGE PROTECTIVE GROUPS FOR THE SYNTHESIS OF BIOPOLYMERS | Febit AG (DE) | 2004-03-31 | — | — | EP | disclosed |
| WO-2003004510-A1 | TWO-STAGE PROTECTIVE GROUPS FOR THE SYNTHESIS OF BIOPOLYMERS | FEBIT AG (DE) | 2003-01-16 | — | — | WO | disclosed |
| EP-0953590-A1 | Polyimides, process for producting the same and photosensitive composition containing the same | Nippon Mektron, Limited (JP) | 1999-11-03 | — | — | EP | disclosed |
| EP-0554101-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-08-04 | — | — | EP | disclosed |
| EP-0373251-A1 | Additive for heat-sensitive recording material, the recording material, and method for production of the recording material | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1990-06-20 | — | — | EP | disclosed |
| EP-0164417-B1 | THERMAL RECORDING MATERIAL | NIPPON STEEL CHEMICAL CO., LTD. (JP) | 1989-03-15 | — | — | EP | disclosed |
| EP-0000146-B1 | BLENDS OF PHENOLPHTHALEIN POLYCARBONATES WITH RUBBER-MODIFIED MONOVINYLIDENE AROMATIC COPOLYMERS | THE DOW CHEMICAL COMPANY (US) | 1982-04-28 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11747728-B2 | Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin | RER1, FEM1B, UNC119 | GABRA1 408/4885GABRB2 906/4885TSHR 3874/4885 |
| US-20210109448-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD AND METHOD FOR PURIFYING RESIN | RER1, FEM1B, UNC119 | GABRA1 408/4885GABRB2 906/4885TSHR 3874/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.