Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TYR | P14679 | 1/20 | 0.67 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
| ▸ | GAA | P10253 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19806928 | 0.89 | TYR (0.52) | TYR | |
| SCHEMBL19806864 | 0.89 | TYR (0.54) | TYRALOX5ALDH1A1GAAKMT2A | |
| SCHEMBL9064707 | 0.87 | TYR (0.50) | TYRALDH1A1GAAKMT2ATDP1 | |
| SCHEMBL51791 | 0.83 | TYR (0.52) | TYRALOX5ALDH1A1GAAKMT2A | |
| SCHEMBL19806923 | 0.83 | TYR (0.47) | TYRALOX5 | |
| SCHEMBL3793824 | 0.83 | TYR (0.50) | TYRALDH1A1GAAKMT2ATDP1 | |
| SCHEMBL28642768 | 0.82 | TYR (0.52) | TYR | |
| SCHEMBL17703180 | 0.82 | TYR (0.65) | TYRALOX5GAAKMT2A | |
| SCHEMBL11865275 | 0.82 | TYR (0.65) | TYRALOX5GAAKMT2A | |
| SCHEMBL574310 | 0.80 | TYR (0.62) | TYRALOX5GAAKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210070683-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-03-11 | — | — | US | disclosed |
| US-20210070685-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-03-11 | — | — | US | disclosed |
| US-20210070727-A1 | COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-03-11 | — | — | US | disclosed |
| WO-2018016640-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD | 三菱瓦斯化学株式会社 | 2018-01-25 | — | — | WO | disclosed |
| EP-2181853-B1 | Thermosensitive recording medium | JUJO PAPER CO LTD (JP) | 2015-09-23 | — | — | EP | disclosed |
| US-8492308-B2 | Thermosensitive recording medium | NIPPON PAPER INDUSTRIES CO., LTD. (JP) | 2013-07-23 | — | — | US | disclosed |
| US-8129307-B2 | Thermosensitive recording medium | NIPPON PAPER INDUSTRIES CO., LTD. (JP) | 2012-03-06 | — | — | US | disclosed |
| US-20110269622-A1 | THERMOSENSITIVE RECORDING MEDIUM | NIPPON PAPER INDUSTRIES CO., LTD. (JP) | 2011-11-03 | — | — | US | disclosed |
| US-20110130281-A1 | THERMOSENSITIVE RECORDING MEDIUM | API CORPORATION | 2011-06-02 | — | — | US | disclosed |
| EP-2261045-A1 | HEAT-SENSITIVE RECORDING MEDIUM | Nippon Paper Industries Co., Ltd. (JP) | 2010-12-15 | — | — | EP | disclosed |
| US-20040241598-A1 | Developer for thermal recording material and thermal recording materials | NIPPON PAPER INDUSTRIES CO., LTD. (JP) | 2004-12-02 | — | — | US | disclosed |
| EP-1437231-A1 | DEVELOPER FOR THERMAL RECORDING MATERIAL AND THERMAL RECORDING MATERIALS | API Corporation (JP) | 2004-07-14 | — | — | EP | disclosed |
| EP-0725053-B1 | Selected O-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions | OLIN MICROELECTRONIC CHEM INC (US) | 2000-04-05 | — | — | EP | disclosed |
| EP-0840170-B1 | Selected O-quinonediazide sulfonic acid esters of phenolic compounds | OLIN MICROELECTRONIC CHEM INC (US) | 2000-04-05 | — | — | EP | disclosed |
| EP-0840170-A1 | Selected O-quinonediazide sulfonic acid esters of phenolic compounds | OCG MICROELECTRONIC MATERIALS, INC. (US) | 1998-05-06 | — | — | EP | disclosed |
| US-5602260-A | PHOTORESISTS | OCG MICROELECTRONIC MATERIALS, INC. (US) | 1997-02-11 | — | — | US | disclosed |
| US-5547814-A | PHOTORESISTS | OCG MICROELECTRONIC MATERIALS, INC. (US) | 1996-08-20 | — | — | US | disclosed |
| EP-0725053-A1 | Selected O-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions | OCG MICROELECTRONIC MATERIALS, INC. (US) | 1996-08-07 | — | — | EP | disclosed |
| US-5541033-A | PHOTOSENSITIVE COMPOUNDS FOR POSITIVE PHOTORESISTS FORMING PATTERNS | OCG MICROELECTRONIC MATERIALS, INC. (US) | 1996-07-30 | — | — | US | disclosed |
| US-5153096-A | Heat resistance, resolution, accuracy, for semiconductors | FUJI PHOTO FILM CO., LTD. (JP) | 1992-10-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210070683-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD | RER1, RTN4, FEM1B | TYR 3769/4885ALOX5 205/4885ALDH1A1 2915/4885 |
| US-20210070727-A1 | COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD | RDX, RTN4, CROCC | TYR 3175/4885ALOX5 430/4885ALDH1A1 2692/4885 |
| US-20210070685-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD | RER1, RTN4, FEM1B | TYR 3769/4885ALOX5 205/4885ALDH1A1 2915/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.